The role of oxygen in the one step amination process of nanocrystalline diamond surface

被引:22
作者
Torrengo, S. [1 ,2 ]
Miotello, A. [1 ]
Minati, L. [2 ]
Bernagozzi, I. [2 ]
Ferrari, M. [3 ]
Dipalo, M. [4 ]
Kohn, E. [4 ]
Speranza, G. [2 ]
机构
[1] Univ Trent, Phys Dep, I-38123 Povo, Trento, Italy
[2] Fdn Bruno Kessler, I-38123 Trento, Italy
[3] CNR IFN, CSMFO Lab, I-38123 Trento, Italy
[4] Univ Ulm, Inst Electron Devices & Circuits, Ulm, Germany
关键词
NCD; Amination; UV irradiation; XPS; CHEMICAL-MODIFICATION; FILMS; PLASMA; FUNCTIONALIZATION; SILICON;
D O I
10.1016/j.diamond.2011.05.014
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanocrystalline diamond (NCD) thin films are ideal to realize platform for bio-chemical sensors. They interface in a very specific way with the environment and the surface termination controls their electrochemical behavior. Generally the as-deposited NCD diamond surface is hydrogen terminated and several techniques are reported to obtain covalent bonding of biological matter. Among others, amino-functional groups are very versatile linkers to biomolecules. Grafting of amino groups to the diamond surface includes: chlorination and exposure to ammonia gas under thermal conditions, radio-frequency plasma or a one step method consisting of UV irradiation in a pure ammonia atmosphere. This last technique is very promising, combining surface functionalization with the realization of SGFETs (Solution Gate FE), and thus being compatible with semiconductor technologies. Experimental data from literature show that ammonia functional groups are always accompanied by the presence of oxygen which degrades the NCD conductivity. In this work we report on XPS in situ study to understand the role of oxygen in the one step amination process. Five NCD samples with different surface terminations (hydrogenated, plasma oxidized, chemically oxidized and UV oxidized) were irradiated with UV photons in different atmospheres (pure NH(3) or NH(3) + O(2)). XPS analysis shows that the presence of oxygen, both on the surface and in the gas mixture, strongly increases the efficiency of the UV surface amination. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:990 / 994
页数:5
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