Adsorption of hydrogen on clean and potassium modified low index copper surfaces: Cu(100) and Cu(110)

被引:7
|
作者
Thomsen, L
Onsgaard, J
Godowski, PJ
Moller, P
Hoffmann, SV
机构
[1] Odense Univ, Inst Fys, DK-5230 Odense M, Denmark
[2] Univ Wroclaw, Inst Expt Phys, PL-50204 Wroclaw, Poland
[3] Aarhus Univ, Inst Storage Ring Facil, DK-8000 Aarhus, Denmark
[4] Univ Aalborg, Inst Phys, DK-9220 Aalborg, Denmark
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2001年 / 19卷 / 04期
关键词
D O I
10.1116/1.1359552
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The adsorption of atomic hydrogen has been studied on clean and potassium modified Cu(110) and Cu(100) surfaces. Two hydrogen induced states in the valence band have been found on the clean Cu(110) surface, an a state receding in the subsurface and a beta state in the surface of the crystal. Upon annealing, hydrogen in the subsurface both diffuses to the surface and desorbs at 330 K, and diffuses into the bulk. Two states, alpha (K) and beta (K), have also been observed on the potassium modified surfaces, with the aK state assigned to a potassium-hydrogen bond and the alpha (K) state assigned to a Cu-hydrogen bond. The Cu(110) surface is significantly more reactive than the Cu(100) surface. (C) 2001 American Vacuum Society.
引用
收藏
页码:1988 / 1992
页数:5
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