Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser

被引：44

作者：

Brizuela, F ^{[1
]}

Vaschenko, G

Brewer, C

Grisham, M

Menoni, CS

Marconi, MC

Rocca, JJ

Chao, W

Liddle, JA

Anderson, EH

Attwood, DT

Vinogradov, AV

Artioukov, IA

Pershyn, YP

Kondratenko, VV

机构：

[1] Colorado State Univ, NSF, ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA

[2] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[3] Lawrence Berkeley Lab, NSF, ERC Extreme Ultraviolet Sci & Technol, Berkeley, CA 94720 USA

[4] Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

[5] Univ Calif Berkeley, Berkeley, CA 94720 USA

[6] PN Lebedev Phys Inst, Moscow 117942, Russia

[7] Natl Tech Univ KhPI, Met & Semicond Phys Dept, Kharkov, Ukraine

来源：

OPTICS EXPRESS | 2005年 / 13卷 / 11期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1364/OPEX.13.003983

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We report the demonstration of reflection mode imaging of 100 nm- scale features using 46.9 nm light from a compact capillary- discharge laser. Our imaging system employs a Sc/ Si multilayer coated Schwarzschild condenser and a freestanding zone plate objective. The reported results advance the development of practical and readily available surface and nanostructure imaging tools based on the use of compact sources of extreme ultraviolet light. (C) 2005 Optical Society of America.

引用

页码：3983 / 3988

页数：6

共 14 条

[1] Schwarzschild soft-x-ray microscope for imaging of nonradiating objects [J].

Artioukov, IA ;

Vinogradov, AV ;

Asadchikov, VE ;

Kasyanov, YS ;

Serov, RV ;

Fedorenko, AI ;

Kondratenko, VV ;

Yulin, SA .

OPTICS LETTERS, 1995, 20 (24) :2451-2453

[2] Demonstration of a high average power tabletop soft X-ray laser [J].

Benware, BR ;

Macchietto, CD ;

Moreno, CH ;

Rocca, JJ .

PHYSICAL REVIEW LETTERS, 1998, 81 (26) :5804-5807

[3] Soft 20-nm resolution x-ray microscopy demonstrated by use of multilayer test structures [J].

Chao, WL ;

Anderson, E ;

Denbeaux, GP ;

Harteneck, B ;

Liddle, JA ;

Olynick, DL ;

Pearson, AL ;

Salmassi, F ;

Song, CY ;

Attwood, DT .

OPTICS LETTERS, 2003, 28 (21) :2019-2021

[4] 1ST STAGE IN THE DEVELOPMENT OF A SOFT-X-RAY REFLECTION IMAGING MICROSCOPE IN THE SCHWARZSCHILD CONFIGURATION USING A SOFT-X-RAY LASER AT 18.2 NM [J].

DICICCO, DS ;

KIM, D ;

ROSSER, R ;

SUCKEWER, S .

OPTICS LETTERS, 1992, 17 (02) :157-159

[5] From micro to nano: recent advances in high-resolution microscopy [J].

Garini, Y ;

Vermolen, BJ ;

Young, IT .

CURRENT OPINION IN BIOTECHNOLOGY, 2005, 16 (01) :3-12

[6] Evaluation of finished extreme ultraviolet lithography (EUVL) masks using a EUV microscope [J].

Haga, T ;

Kinoshita, H ;

Hamamoto, K ;

Takada, S ;

Kazui, N ;

Kakunai, S ;

Tsubakino, H ;

Watanabe, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (6B) :3771-3775

[7]

LIBERTUN AR, 2004, C LAS EL

[8]

Liu Y, 2001, PHYS REV A, V63, DOI 10.1103/PhysRevA.63.033802

[9] Status of EUV microexposure capabilities at the ALS using the 0.3-NA MET optic [J].

Naulleau, P ;

Goldberg, KA ;

Anderson, E ;

Bradley, K ;

Delano, R ;

Denham, P ;

Gunion, B ;

Harteneck, B ;

Hoef, B ;

Huang, HJ ;

Jackson, K ;

Jones, G ;

Kemp, D ;

Liddle, JA ;

Oort, R ;

Rawlins, A ;

Rekawa, S ;

Salmassi, F ;

Tackaberry, R ;

Chung, C ;

Hale, L ;

Phillion, D ;

Sommargren, G ;

Taylor, J .

EMERGING LITHOGRAPHIC TECHNOLOGIES VIII, 2004, 5374 :881-891

[10] COMPACT SCANNING SOFT-X-RAY MICROSCOPE USING A LASER-PRODUCED PLASMA SOURCE AND NORMAL-INCIDENCE MULTILAYER MIRRORS [J].

TRAIL, JA ;

BYER, RL .

OPTICS LETTERS, 1989, 14 (11) :539-541

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