Onset of blistering in hydrogen-implanted silicon

被引:62
作者
Huang, LJ [1 ]
Tong, QY
Chao, YL
Lee, TH
Martini, T
Gösele, U
机构
[1] Duke Univ, Sch Engn, Durham, NC 27708 USA
[2] Max Planck Inst Microstruct Phys, D-06120 Halle, Germany
关键词
D O I
10.1063/1.123430
中图分类号
O59 [应用物理学];
学科分类号
摘要
The onset of surface blistering in hydrogen-implanted single crystalline silicon was studied. A combination of atomic force microscopy and optical measurements shows that hydrogen-containing platelets grow laterally below silicon surface until they suddenly pop up as surface blisters due to the internal hydrogen pressure after a critical size has been reached. Experimentally and theoretically, the critical size of the onset blisters was found to increase with increasing implantation depth or top layer thickness. (C) 1999 American Institute of Physics. [S0003-6951(99)01207-3].
引用
收藏
页码:982 / 984
页数:3
相关论文
共 50 条
[41]   HYDROGEN-IMPLANTED AND HELIUM-IMPLANTED SILICON - LOW-TEMPERATURE POSITRON-LIFETIME STUDIES [J].
MAKINEN, S ;
RAJAINMAKI, H ;
LINDEROTH, S .
PHYSICAL REVIEW B, 1991, 44 (11) :5510-5517
[42]   DESORPTION AND OTHER EFFECTS OF PULSED-LASER ANNEALING OF HYDROGEN-IMPLANTED SILICON [J].
BOIVIN, R ;
TERREAULT, B .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (04) :1943-1951
[43]   Study of shallow donor formation in hydrogen-implanted n-type silicon [J].
Tokuda, Y ;
Ito, A ;
Ohshima, H .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1998, 13 (02) :194-199
[44]   Molecular dynamics study on splitting of hydrogen-implanted silicon in Smart-Cuttechnology [J].
王冰 ;
古斌 ;
潘荣莹 ;
张思佳 ;
沈建华 .
Journal of Semiconductors, 2015, (03) :148-153
[45]   Microstructural study of hydrogen-implanted beryllium [J].
Vagin, SP ;
Chakrov, PV ;
Utkelbayev, BD ;
Jacobson, LA ;
Field, RD ;
Kung, H .
JOURNAL OF NUCLEAR MATERIALS, 1998, 258 :719-723
[46]   Electron paramagnetic resonance study of S2 defects in hydrogen-implanted silicon [J].
Rakvin, B ;
Pivac, B ;
Tonini, R ;
Corni, F ;
Ottaviani, G .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 170 (1-2) :125-133
[47]   Growth of nanoparticles in hydrogen-implanted palladium subsurfaces [J].
F. Okuyama .
Applied Physics A, 2010, 100 :245-248
[48]   METHANE FORMATION IN HYDROGEN-IMPLANTED GRAPHITE AND CARBIDES [J].
PONTAU, AE ;
WILSON, KL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (04) :1322-1323
[49]   SUBSURFACE MOLECULE FORMATION IN HYDROGEN-IMPLANTED GRAPHITE [J].
MOLLER, W ;
SCHERZER, BMU .
APPLIED PHYSICS LETTERS, 1987, 50 (26) :1870-1872
[50]   Observation of low-temperature diffusion of aluminum impurity atoms in hydrogen-implanted silicon [J].
Gorelkinskii, YV ;
Mukashev, BN ;
Abdullin, KA .
SEMICONDUCTORS, 1998, 32 (04) :375-381