Onset of blistering in hydrogen-implanted silicon

被引:62
|
作者
Huang, LJ [1 ]
Tong, QY
Chao, YL
Lee, TH
Martini, T
Gösele, U
机构
[1] Duke Univ, Sch Engn, Durham, NC 27708 USA
[2] Max Planck Inst Microstruct Phys, D-06120 Halle, Germany
关键词
D O I
10.1063/1.123430
中图分类号
O59 [应用物理学];
学科分类号
摘要
The onset of surface blistering in hydrogen-implanted single crystalline silicon was studied. A combination of atomic force microscopy and optical measurements shows that hydrogen-containing platelets grow laterally below silicon surface until they suddenly pop up as surface blisters due to the internal hydrogen pressure after a critical size has been reached. Experimentally and theoretically, the critical size of the onset blisters was found to increase with increasing implantation depth or top layer thickness. (C) 1999 American Institute of Physics. [S0003-6951(99)01207-3].
引用
收藏
页码:982 / 984
页数:3
相关论文
共 50 条
  • [21] STRUCTURE AND EVOLUTION OF THE DISPLACEMENT FIELD IN HYDROGEN-IMPLANTED SILICON
    CEROFOLINI, GF
    MEDA, L
    VOLPONES, C
    OTTAVIANI, G
    DEFAYETTE, J
    DIERCKX, R
    DONELLI, D
    ORLANDINI, M
    ANDERLE, M
    CANTERI, R
    CLAEYS, C
    VANHELLEMONT, J
    PHYSICAL REVIEW B, 1990, 41 (18): : 12607 - 12618
  • [22] Behavior of implanted hydrogen in thermally stimulated blistering in silicon
    Aleksandrov, PA
    Baranova, EK
    Baranova, IV
    Budaragin, VV
    Litvinov, VL
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2003, 158 (11-12): : 771 - 781
  • [23] TEMPERATURE AND DOSE DEPENDENCE OF DAMAGE ACCUMULATION IN HYDROGEN-IMPLANTED SILICON
    HALL, BO
    JOURNAL OF METALS, 1985, 37 (08): : A21 - A21
  • [24] NEW INFRARED-ABSORPTION BANDS IN HYDROGEN-IMPLANTED SILICON
    MUKASHEV, BN
    NUSSUPOV, KH
    TAMENDAROV, MF
    PHYSICS LETTERS A, 1979, 72 (4-5) : 381 - 383
  • [25] Study of the crystalline quality of exfoliated surfaces in hydrogen-implanted silicon
    Breese, MBH
    Alves, LC
    Hoechbauer, T
    Nastasi, M
    APPLIED PHYSICS LETTERS, 2000, 77 (02) : 268 - 270
  • [26] Effect of substrate orientation on microstructure of hydrogen-implanted silicon wafers
    Xiao, Qinghua
    Tu, Hailing
    Wang, Jing
    Zhou, Qigang
    Zhang, Guohu
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2003, 24 (12): : 1285 - 1288
  • [27] Microstructure evolution of hydrogen-implanted silicon during the annealing process
    Wang, J
    Xiao, QH
    Tu, HL
    Shao, BL
    Liu, AS
    MICROELECTRONIC ENGINEERING, 2003, 66 (1-4) : 314 - 319
  • [28] DO WE REALLY OBSERVE MULTISILANES IN HYDROGEN-IMPLANTED SILICON
    TATARKIEWICZ, J
    KROL, A
    ACTA PHYSICA POLONICA A, 1988, 73 (02) : 211 - 214
  • [29] Investigation of Blistering Phenomena in Hydrogen-Implanted GaN and AlN for Thin Film Layer Transfer Applications
    Singh, R.
    Scholz, R.
    Christiansen, S. H.
    Goesele, U.
    ADVANCES IN GAN, GAAS, SIC AND RELATED ALLOYS ON SILICON SUBSTRATES, 2008, 1068 : 129 - +
  • [30] Fracture in Hydrogen-Implanted Germanium
    Mazen, F.
    Tauzin, A.
    Sanchez, L.
    Chieux, F.
    Deguet, C.
    Augendre, E.
    Akatsu, T.
    Richtarch, C.
    Clavelier, L.
    ION IMPLANTATION TECHNOLOGY 2008, 2008, 1066 : 217 - +