Chemically directed self-assembly of perpendicularly aligned cylinders by a liquid crystalline block copolymer

被引：0

作者：

Yamashita, N. ^{[1
]}

Watanabe, S. ^{[2
]}

Nagai, K. ^{[1
]}

Komura, M. ^{[1
]}

Iyoda, T. ^{[1
,2
]}

Aida, K. ^{[3
]}

Tada, Y. ^{[3
]}

Yoshida, H. ^{[3
]}

机构：

[1] Tokyo Inst Technol, Div Integrated Mol Engn, Chem Resources Lab, Yokohama, Kanagawa 2268503, Japan

[2] Japan Sci & Technol Agcy JST, ERATO, Iyoda Supra Integrated Mat Project iSIM, Chiyoda Ku, Tokyo 453, Japan

[3] Hitachi Ltd, Hitachi Res Lab, Hitachi, Ibaraki 3191292, Japan

来源：

JOURNAL OF MATERIALS CHEMISTRY C | 2015年 / 3卷 / 12期

基金：

日本学术振兴会;

关键词：

AG-NANOPARTICLE ARRAY; DIBLOCK COPOLYMERS; DENSITY MULTIPLICATION; TEMPLATE; NANOSTRUCTURES; GRAPHOEPITAXY; LITHOGRAPHY; GRAPHENE; FILMS;

D O I：

10.1039/c4tc02851a

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Chemical epitaxy with a density multiplication process was applied to the perpendicularly oriented hexagonal cylinder nanostructure of liquid crystalline block copolymer (PEO-b-PMA(Az)) thin film through thermally induced microphase separation by using a newly designed PMA(Az)(24) brush. The hexagonal lattice orientation with 1.9 tera-cylinders per inch(2) was laterally controlled for long-range-ordered direct self-assembly. Furthermore, the direct pattern-transfer of the assembled structure to an Au nanodot array was demonstrated by doping of HAuCl4 selectively into the PEO cylindrical microdomains and then vacuum ultraviolet light irradiation to cause polymer etching and reduction of the Au ions.

引用

页码：2837 / 2847

页数：11