Low potential barrier height effects in magnetic tunneling junctions

被引：5
|
作者：
de Gracia, E. S. Cruz [1 ]
Dorneles, L. S. [2 ]
Schelp, L. F. [2 ]
Teixeira, S. R. [1 ]
Baibich, M. N. [1 ]
机构：
[1] Univ Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil
[2] Univ Fed Santa Maria, Dept Fis, BR-97105900 Santa Maria, RS, Brazil
来源：
PHYSICAL REVIEW B | 2007年 / 76卷 / 21期
关键词：
D O I：
10.1103/PhysRevB.76.214426
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
This paper reports on the study of deposited (Ni81Fe19/AlOx/Co) magnetic tunnel junctions by magnetron sputtering, with the insulating layer obtained by plasma oxidation of Al. Concentration of the tunnel current in small areas of the junctions and low potential barrier heights were identified by fitting, for each individual sample, the room temperature I-V curves with either Simmons' [J. Appl. Phys. 34, 1793 (1963); 35, 2655 (1964); 34, 2581 (1963)] or Chow's [J. Appl. Phys. 36, 559 (1965)] model. A fast decrease of the tunnel magnetoresistance as a function of the bias voltage is observed, with an inversion of its signal above a critical value. The results are discussed in terms of the quantum coherence factor for low height insulating barriers.
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页数：7
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