Electrodeposition of chromium-tungsten alloy from organo-aqueous solutions containing dimethyl formamide

被引：6

作者：

Kuznetsov, V. V. ^{[1
]}

Pavlov, L. N. ^{[1
]}

Vinokurov, E. G. ^{[1
]}

Filatova, E. A. ^{[1
]}

Kudryavtsev, V. N. ^{[1
]}

机构：

[1] Mendeleev Univ Chem Technol, Moscow 125047, Russia

来源：

RUSSIAN JOURNAL OF ELECTROCHEMISTRY | 2015年 / 51卷 / 02期

基金：

俄罗斯基础研究基金会;

关键词：

electrodeposition; cathodic deposits; chromium; tungsten; SULFURIC-ACID-SOLUTIONS; CR3+ IONS; BEHAVIOR; ELECTROREDUCTION; CODEPOSITION; MECHANISM; COATINGS; KINETICS; SULFATE; BATH;

D O I：

10.1134/S102319351502010X

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The coatings containing up to 0.6 at % W were obtained from dimethyl formamide-aqueous solutions of chromium(III) chloride and sodium tungstate. At the electrode potentials more negative than -0.92 V (SHE), the reduction of Cr(III) and W(VI) compounds proceeds up to zero oxidation state. Thus obtained deposits contain a considerable amount of carbon (carbides).

引用

页码：174 / 179

页数：6

共 31 条

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