In situ study of noble metal atomic layer deposition processes using grazing incidence small angle X-ray scattering

被引：0

作者：

Dendooven, J. ^{[1
]}

Solano, E. ^{[1
,2
]}

Feng, J. -Y. ^{[1
]}

Ramachandran, R. K. ^{[1
]}

Minjauw, M. M. ^{[1
]}

Van Daele, M. ^{[1
]}

Coati, A. ^{[3
]}

Hermida-Merino, D. ^{[4
]}

Detavernier, C. ^{[1
]}

机构：

[1] Univ Ghent, Dept Solid State Sci, COCOON Grp, Krijgslaan 281-S1, B-9000 Ghent, Belgium

[2] ALBA Synchrotron Light Source, SWEET NCD Beamline, Carrer Llum 2-26, Cerdanyola Del Valles 08290, Spain

[3] Synchrotron SOLEIL, SixS Beamline, BP48, F-91192 Gif Sur Yvette, France

[4] ESRF European Synchrotron, DUBBLE Beamline BM126, Ave Martyrs,CS40220, F-38043 Grenoble, France

来源：

ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 2021年 / 77卷

关键词：

nanoparticles; nucleation; ALD; GISAXS; in situ;

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

MS-15-1

引用

页码：C136 / C136

页数：1

共 6 条

[1] Surface mobility and impact of precursor dosing during atomic layer deposition of platinum: in situ monitoring of nucleation and island growth [J].

Dendooven, Jolien ;

Van Daele, Michiel ;

Solano, Eduardo ;

Ramachandran, Ranjith K. ;

Minjauw, Matthias M. ;

Resta, Andrea ;

Vlad, Alina ;

Garreau, Yves ;

Coati, Alessandro ;

Portale, Giuseppe ;

Detavernier, Christophe .

PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2020, 22 (43) :24917-24933

[2] Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition [J].

Dendooven, Jolien ;

Ramachandran, Ranjith K. ;

Solano, Eduardo ;

Kurttepeli, Mert ;

Geerts, Lisa ;

Heremans, Gino ;

Ronge, Jan ;

Minjauw, Matthias M. ;

Dobbelaere, Thomas ;

Devloo-Casier, Kilian ;

Martens, Johan A. ;

Vantomme, Andre ;

Bals, Sara ;

Portale, Giuseppe ;

Coati, Alessandro ;

Detavernier, Christophe .

NATURE COMMUNICATIONS, 2017, 8

[3] Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition [J].

Dendooven, Jolien ;

Solano, Eduardo ;

Minjauw, Matthias M. ;

Van de Kerckhove, Kevin ;

Coati, Alessandro ;

Fonda, Emiliano ;

Portale, Giuseppe ;

Garreau, Yves ;

Detavernier, Christophe .

REVIEW OF SCIENTIFIC INSTRUMENTS, 2016, 87 (11)

[4] Tuning size and coverage of Pd nanoparticles using atomic layer deposition [J].

Feng, Ji-Yu ;

Ramachandran, Ranjith K. ;

Solano, Eduardo ;

Minjauw, Matthias M. ;

Van Daele, Michiel ;

Vantomme, Andre ;

Hermida-Merino, Daniel ;

Coati, Alessandro ;

Poelman, Hilde ;

Detavernier, Christophe ;

Dendooven, Jolien .

APPLIED SURFACE SCIENCE, 2021, 539

[5] Surface poisoning in the nucleation and growth of palladium atomic layer deposition with Pd(hfac)2 and formalin [J].

Goldstein, D. N. ;

George, S. M. .

THIN SOLID FILMS, 2011, 519 (16) :5339-5347

[6] Atomic layer deposition-Sequential self-limiting surface reactions for advanced catalyst "bottom-up" synthesis [J].

Lu, Junling ;

Elam, Jeffrey W. ;

Stair, Peter C. .

SURFACE SCIENCE REPORTS, 2016, 71 (02) :410-472

← 1 →