Memristive properties of transparent oxide semiconducting (Ti, Cu) Ox-gradient thin film

被引:7
作者
Domaradzki, Jaroslaw [1 ]
Kotwica, Tomasz [1 ]
Mazur, Michal [1 ]
Kaczmarek, Danuta [1 ]
Wojcieszak, Damian [1 ]
机构
[1] Wroclaw Univ Sci & Technol, Fac Microsyst Elect & Photon, Janiszewskiego 11-17, PL-50372 Wroclaw, Poland
关键词
memristor; gradient thin film; oxide semiconductor; magnetron sputtering; FABRICATION; MECHANISM;
D O I
10.1088/1361-6641/aa98ce
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The paper presents the results of the analysis of memristive properties observed in (Ti, Cu)-oxide thin film with gradient distribution of elements, prepared using the multi-source reactive magnetron co-sputtering process. The performed electrical measurements showed the presence of pinched hysteresis loops in the voltage-current plane for direct and alternating current bipolar periodic signal stimulation. Investigations performed using a transmission electron microscope equipped with an energy dispersive spectrometer showed that the elemental composition at the cross section of the thin film was very well correlated with the gradient V-shaped profile of the powering of the magnetron source equipped with a Cu target. The prepared samples were transparent in the visible part of optical radiation. The obtained results showed that the prepared gradient (Ti, Cu)O-x thin film could be an interesting alternative to the conventional multilayer stack construction of memristive devices, which makes them a promising material for manufacturing transparent memory devices for transparent electronics.
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页数:7
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