TEM validation of CD AFM image reconstruction:TB part II

被引:4
作者
Dahlen, Gregory A. [1 ]
Liu, Hao-Chih [2 ]
Osborn, Marc [2 ]
Osborne, Jason R. [2 ]
Tracy, Bryan [3 ]
del Rosario, Amalia [3 ]
机构
[1] Thorleaf Res Inc, 1821 Laguna St, Santa Barbara, CA 93101 USA
[2] Veeco Instruments Inc, Santa Barbara, CA 93117 USA
[3] Spansion Inc, Sunnyvale, CA 94088 USA
来源
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXII, PTS 1 AND 2 | 2008年 / 6922卷 / 1-2期
关键词
TEM; CDAFM; metrology; image reconstruction; morphology; Reference Metrology System; RMS; line width variation; LWV; CNT;
D O I
10.1117/12.773237
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
The present paper is a continuation of an investigation to validate CD AFM image reconstruction using Transmission Electron Microscopy (TEM) as the Reference Metrology System (RMS).(1) In the present work, the validation of CD AFM with TEM is extended to include a 26 nm diameter carbon nanotube (CNT) tip for non-reentrant feature scans. The use of DT (deep trench) mode and a CNT tip provides detailed bottom feature resolution and close mid-CD agreement with both TEM and prior CD mode AFM scans (using a high resolution Trident tip). Averaging AFM scan lines within the similar to 80 nm thickness region of the TEM sample(2) is found to reduce systematic error with the RMS. Similarly, errors in alignment between AFM scan lines and TEM sample are corrected by a moving average method. Next, the NanoCD standard(3) is used for complete 2D tip shape reconstruction (non-reentrant) utilizing its traceable feature width and well-defined upper-corner radius. The shape of the NanoCD is morphologically removed from the tip/standard image, thus providing the tip's shape with bounded dimensional uncertainty. Finally, an update of the measurement uncertainty budget for the current generation CD AFM is also presented, thus extending the prior work by NIST.(4).
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页数:14
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