Multilayer-Based Optics for High-Brightness X-ray Sources

被引：1

作者：

Bajt, S. ^{[1
]}

Chapman, H. N. ^{[4
]}

Krzywinski, J. ^{[2
]}

Nelson, A. J. ^{[3
]}

Aquila, A. ^{[4
]}

Barthelmess, M. ^{[1
]}

机构：

[1] DESY, Notkestr 85, D-22607 Hamburg, Germany

[2] SLAC, Natl Accelerator Lab, Menlo Pk, CA 94025 USA

[3] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

[4] DESY, Ctr Free Elect Laser Sci, D-22607 Hamburg, Germany

来源：

10TH INTERNATIONAL CONFERENCE ON X-RAY MICROSCOPY | 2011年 / 1365卷

基金：

瑞典研究理事会;

关键词：

X-ray optics; multilayers; x-ray FEL; damage; FREE-ELECTRON LASER; EXTREME-ULTRAVIOLET LITHOGRAPHY; CARBON CONTAMINATION; HIGH-EFFICIENCY; ZONE PLATES; DIFFRACTION; HOLOGRAPHY; RADIATION; OPERATION; CAMERA;

D O I：

10.1063/1.3625301

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

High-brightness x-ray sources, such as next-generation synchrotrons and free-electron lasers (FELs), pose unique challenges for the development of x-ray optics. The peak intensities of FEL pulses can be high enough to convert any material placed in a focused beam into plasma. X-ray optics, which are used close to the focal spot, are likely to be partially or completely damaged in a single shot. Such optics would need to be replenished after each shot. Optics that are used in the unfocused or indirect beam may survive much longer, perhaps indefinitely, if care is used to limit the energy absorbed in the optics. Here we present different types of multilayer-based optics, which were used successfully in FEL experiments for reflecting, focusing, and filtering high-intensity, pulsed x-rays in a variety of novel science applications.

引用

页码：46 / 51

页数：6

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