A new approach to metal surface nitriding using dielectric barrier discharge at atmospheric pressure

被引：15

作者：

Yan, L ^{[1
]}

Zhu, XH ^{[1
]}

Xu, JJ ^{[1
]}

Gao, YZ ^{[1
]}

Qin, Y ^{[1
]}

Bai, XY ^{[1
]}

机构：

[1] Dalian Maritime Univ, Inst Mat & Technol, Dalian 116026, Peoples R China

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 2005年 / 25卷 / 05期

基金：

中国国家自然科学基金;

关键词：

dielectric barrier discharge; plasma nitriding at atmospheric pressure; non-equilibrium plasma;

D O I：

10.1007/s11090-005-4993-2

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

A new approach to metal surface nitriding using dielectric barrier discharge (DBD) plasma at atmospheric pressure is presented in this paper. Results of the study show that the plasma nitriding at atmospheric pressure using DBDs is realizable. Harder and thicker compound layer and diffusion layer on the treated surface has been formed in shorter treatment time comparing with the conventional vacuum plasma nitriding, Increasing the applied voltage will facilitate the formation of a thicker nitrided layer using the DBD. The nitrided layer acquired by this new approach is mainly composed of epsilon phase and gamma' phase, and the crystal grains of the epsilon phase is fine and has high dislocations density.

引用

页码：467 / 483

页数：17

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