Cl atom desorption by chemical reaction with Al atom on Si(111) 7x7 studied by scanning tunneling microscopy

被引：0
|
作者：
Baba, M
Matsui, S
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1996年 / 35卷 / 12B期
关键词：
scanning tunneling microscope; chlorine; aluminum; chemical reaction;
D O I：
10.1143/JJAP.35.6540
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The chemical reactivity of Al-Cl and Cl-Si atoms has been studied by in-situ scanning tunneling microscopy (STM). Cl atoms are first adsorbed at room temperature on a Si(111)7 x 7 surface in an ultra-high vacuum STM. Next. Al atoms are evaporated on this surface. As a result, the, Al atoms desorb the Cl atoms from the Si surface, because Cl atoms react more strongly with Al atoms than with Si adatoms.
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页码：6540 / 6543
页数：4
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