Study on Resistance Switching Properties of Na0.5Bi0.5TiO3 Thin Films Using Impedance Spectroscopy

被引:30
|
作者
Zhang, Ting [1 ]
Zhang, Xinan [1 ]
Ding, Linghong [1 ]
Zhang, Weifeng [1 ]
机构
[1] Henan Univ, Sch Phys & Elect, Key Lab Photovolta Mat Henan Prov, Kaifeng 475004, Peoples R China
来源
NANOSCALE RESEARCH LETTERS | 2009年 / 4卷 / 11期
关键词
Na0.5Bi0.5TiO3 (NBT) thin films; Resistance switching; Impedance spectroscopy; Interfacial characteristics; Oxygen vacancies; DIELECTRIC-RELAXATION; SRTIO3;
D O I
10.1007/s11671-009-9397-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The Na0.5Bi0.5TiO3 (NBT) thin films sandwiched between Au electrodes and fluorine-doped tin oxide (FTO) conducting glass were deposited using a sol-gel method. Based on electrochemical workstation measurements, reproducible resistance switching characteristics and negative differential resistances were obtained at room temperature. A local impedance spectroscopy measurement of Au/NBT was performed to reveal the interface-related electrical characteristics. The DC-bias-dependent impedance spectra suggested the occurrence of charge and mass transfer at the interface of the Au/NBT/FTO device. It was proposed that the first and the second ionization of oxygen vacancies are responsible for the conduction in the low-and high-resistance states, respectively. The experimental results showed high potential for nonvolatile memory applications in NBT thin films.
引用
收藏
页码:1309 / 1314
页数:6
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