Measurement strategies and uncertainty estimations for pitch and step height calibrations by metrological atomic force microscope

被引:11
|
作者
Korpelainen, Virpi [1 ]
Seppa, Jeremias [1 ]
Lassila, Antti [1 ]
机构
[1] Ctr Metrol & Accreditat, FI-02151 Espoo, Finland
来源
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2012年 / 11卷 / 01期
关键词
atomic force microscope (AFM); calibration; grating pitch; step height; uncertainty; AFM; STANDARDS; SYSTEM;
D O I
10.1117/1.JMM.11.1.011002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Gratings and step height standards are useful transfer standards for lateral and vertical length scale calibration of atomic force microscopes (AFMs). In order to have traceability to the SI-meter, the standards must have been calibrated prior to use. Metrological AFMs (MAFMs) with online laser interferometric position measurements are versatile instruments for the calibrations. The developed task-specific measurement strategies for step height and pitch calibrations with the Centre for Metrology and Accreditation's (MIKES's) metrological AFM are described. The strategies were developed to give high accuracy and to reduce measurement time. Detailed uncertainty estimations for step height and grating pitch calibrations are also given. Standard uncertainties are 0.016 and 0.018 nm for 300 and 700 nm pitch standards, respectively, and 0.21 and 0.44 nm for 7 and 1000 nm step height standards. (C) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.JMM.11.1.011002]
引用
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页数:7
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