Measurement strategies and uncertainty estimations for pitch and step height calibrations by metrological atomic force microscope

被引:11
|
作者
Korpelainen, Virpi [1 ]
Seppa, Jeremias [1 ]
Lassila, Antti [1 ]
机构
[1] Ctr Metrol & Accreditat, FI-02151 Espoo, Finland
来源
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2012年 / 11卷 / 01期
关键词
atomic force microscope (AFM); calibration; grating pitch; step height; uncertainty; AFM; STANDARDS; SYSTEM;
D O I
10.1117/1.JMM.11.1.011002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Gratings and step height standards are useful transfer standards for lateral and vertical length scale calibration of atomic force microscopes (AFMs). In order to have traceability to the SI-meter, the standards must have been calibrated prior to use. Metrological AFMs (MAFMs) with online laser interferometric position measurements are versatile instruments for the calibrations. The developed task-specific measurement strategies for step height and pitch calibrations with the Centre for Metrology and Accreditation's (MIKES's) metrological AFM are described. The strategies were developed to give high accuracy and to reduce measurement time. Detailed uncertainty estimations for step height and grating pitch calibrations are also given. Standard uncertainties are 0.016 and 0.018 nm for 300 and 700 nm pitch standards, respectively, and 0.21 and 0.44 nm for 7 and 1000 nm step height standards. (C) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.JMM.11.1.011002]
引用
收藏
页数:7
相关论文
共 50 条
  • [1] Measurement strategies and uncertainty estimations for pitch and step height calibrations by metrological AFM
    Korpelainen, V.
    Seppa, J.
    Lassila, A.
    SCANNING MICROSCOPIES 2011: ADVANCED MICROSCOPY TECHNOLOGIES FOR DEFENSE, HOMELAND SECURITY, FORENSIC, LIFE, ENVIRONMENTAL, AND INDUSTRIAL SCIENCES, 2011, 8036
  • [2] Step height measurement by the metrological atomic force microscope
    State Key Laboratory of Precision Measuring Technology and Instruments, Tianjin University, Tianjin 300072, China
    不详
    不详
    Nami Jishu yu Jingmi Gongcheng, 2008, 4 (288-292):
  • [3] Step height measurement by Atomic Force Microscope
    Lui, PKW
    Chen, YL
    Chen, CJ
    Peng, GS
    Lin, VTY
    PROCEEDINGS OF THE SECOND INTERNATIONAL SYMPOSIUM ON INSTRUMENTATION SCIENCE AND TECHNOLOGY, VOL 2, 2002, : 29 - 33
  • [4] Calibration of step height standard using metrological atomic force microscope
    Misumi I.
    Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering, 2021, 87 (09): : 744 - 747
  • [5] Improving step height and pitch measurements using the calibrated atomic force microscope
    Koning, R
    Dixson, R
    Fu, J
    Tsai, VW
    Renegar, TB
    Vorburger, T
    PROCEEDINGS OF THE FIRST INTERNATIONAL SYMPOSIUM ON INSTRUMENTATION SCIENCE AND TECHNOLOGY, 1999, : 548 - 555
  • [6] Atomic Force Microscopy: Step Height Measurement Uncertainty Evaluation
    Razumic, Andrej
    Runje, Biserka
    Lisjak, Dragutin
    Kolar, Davor
    Novak, Amalija Horvatic
    Strbac, Branko
    Savkovic, Borislav
    TEHNICKI GLASNIK-TECHNICAL JOURNAL, 2024, 18 (02): : 209 - 214
  • [7] Profile surface roughness measurement using metrological atomic force microscope and uncertainty evaluation
    Misumi, Ichiko
    Naoi, Kazuya
    Sugawara, Kentaro
    Gonda, Satoshi
    MEASUREMENT, 2015, 73 : 295 - 303
  • [8] Pitch measurement by traceable atomic force microscope
    Chen, Chao-Jung
    Chen, Yen-Liang
    Chang, Liang-Chih
    International Journal of Nanoscience, Vol 2, Nos 4 and 5, 2003, 2 (4-5): : 335 - 341
  • [9] A large range metrological atomic force microscope and its uncertainty analysis
    Gao, S.
    Li, Q.
    Li, W.
    Lu, M.
    Shi, Y.
    SCANNING MICROSCOPIES 2013: ADVANCED MICROSCOPY TECHNOLOGIES FOR DEFENSE, HOMELAND SECURITY, FORENSIC, LIFE, ENVIRONMENTAL, AND INDUSTRIAL SCIENCES, 2013, 8729
  • [10] Atomic force microscope for direct comparison measurement of step height and crystalline lattice spacing
    Fujii, T
    Imabori, K
    Kawakatsu, H
    Watanabe, S
    Bleuler, H
    NANOTECHNOLOGY, 1999, 10 (04) : 380 - 384