Total Reflection X-ray Fluorescence Analysis: Physical Foundations and Analytical Application (A Review)

被引：33

作者：

Alov, N. V. ^{[1
]}

机构：

[1] Moscow MV Lomonosov State Univ, Moscow 119991, Russia

来源：

INORGANIC MATERIALS | 2011年 / 47卷 / 14期

关键词：

X-ray fluorescence analysis; total external reflection of X-rays; chemical analysis; surface; TRACE-ELEMENTS; QUANTITATIVE SURFACE; DEPTH PROFILES; BLOOD-SERUM; SPECTROMETRY; SAMPLES; LAYER; WATER; CONTAMINATIONS; URANIUM;

D O I：

10.1134/S0020168511140020

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The current state of the art in one of the most promising techniques of X-ray spectral analysis, namely, total reflection X-ray fluorescence analysis (TXRF), is summarized. The underlying physical processes, including reflection, refraction, total external reflection (TER) of X-rays, and formation of standing waves by TER, are considered. The construction and crucial components of a modern energy-dispersive TXRF spectrometer, involving X-ray tubes, monochromators, detectors, and reflectors, are described. Examples of analytical application of TXRF are given. High efficiency of this technique for qualitative and quantitative chemical analysis of liquids and solids of various natures is demonstrated. The main research trends in surface analysis and investigation of surface layers of solids by TXRF are discussed.

引用

页码：1487 / 1499

页数：13

共 80 条

[1] METHOD FOR QUANTITATIVE X-RAY-FLUORESCENCE ANALYSIS IN NANOGRAM REGION [J].

AIGINGER, H ;

WOBRAUSC.P .

NUCLEAR INSTRUMENTS & METHODS, 1974, 114 (01) :157-158

[2]

ALIKHANOV AI, 1933, OPTIKA RENTGENOVSKIK

[3]

ALOV N, 2003, MICROSC MICROANAL, V9, P138

[4] Formation of binary and ternary metal deposits on glass-ceramic carbon electrode surfaces: electron-probe X-ray microanalysis, total-reflection X-ray fluorescence analysis, X-ray photoelectron spectroscopy and scanning electron microscopy study [J].

Alov, NV ;

Oskolok, KV .

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 2003, 58 (04) :735-740

[5] Influence of heterogeneous surface morphology on analytical signal formation in total reflection x-ray fluorescence analysis [J].

Alov, NV ;

Oskolok, KV .

X-RAY SPECTROMETRY, 2002, 31 (03) :235-238

[6] Total-reflection X-ray fluorescence study of electrochemical deposition of metals on a glass-ceramic carbon electrode surface [J].

Alov, NV ;

Oskolok, KV ;

Wittershagen, A ;

Mertens, M ;

Rittmeyer, C ;

Rostam-Khani, P ;

Kolbesen, BO .

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 2001, 56 (11) :2117-2126

[7] Comparison of total-reflection X-ray fluorescence, static and portable energy dispersive X-ray fluorescence spectrometers for art and archeometry studies [J].

Ardid, M ;

Ferrero, JL ;

Juanes, D ;

Lluch, JL ;

Roldán, C .

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 2004, 59 (10-11) :1581-1586

[8] X-RAY EVANESCENT-WAVE ABSORPTION AND EMISSION [J].

BECKER, RS ;

GOLOVCHENKO, JA ;

PATEL, JR .

PHYSICAL REVIEW LETTERS, 1983, 50 (03) :153-156

[9] X-RAY STANDING WAVES AT A REFLECTING MIRROR SURFACE [J].

BEDZYK, MJ ;

BOMMARITO, GM ;

SCHILDKRAUT, JS .

PHYSICAL REVIEW LETTERS, 1989, 62 (12) :1376-1379

[10] BASIC FEATURES OF TOTAL-REFLECTION X-RAY-FLUORESCENCE ANALYSIS ON SILICON-WAFERS [J].

BERNEIKE, W .

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1993, 48 (02) :269-275

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