Effect of organic additives on the electrocrystallization and the magnetoresistance of Cu-Co multilayers

被引:39
作者
Chassaing, E [1 ]
机构
[1] CNRS, Ctr Etud Chim Met, F-94407 Vitry Sur Seine, France
关键词
D O I
10.1149/1.1401079
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The electrodeposition of Cu-Co multilayers was investigated in the presence of two additives, sodium dodecylsulfate (SDS) and saccharin. Cyclic voltammetry, steady-state polarization, impedance spectroscopy, and potential pulses were carried out using an electrochemical quartz crystal microbalance. Magnetoresistance measurements were performed on Cu-Co multilayers deposited on indium tin oxide g-lass. Saccharin strongly inhibits the discharge of cobalt whereas SDS has a depolarizing effect. However the reaction path is not markedly changed. The deposition of cobalt starts with a strong evolution of hydrogen due to diffusion-controlled reduction of protons. The giant magnetoresistance ratio is markedly reduced by these additives. (C) 2001 The Electrochemical Society.
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页码:C690 / C694
页数:5
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