Formation of hierarchical silica nanochannels through nanoimprint lithography

被引：8

作者：

Hendricks, Nicholas R. ^{[1
]}

Watkins, James J. ^{[1
]}

Carter, Kenneth R. ^{[1
]}

机构：

[1] Univ Massachusetts, Dept Polymer Sci & Engn, Conte Ctr Polymer Res, Amherst, MA 01003 USA

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2011年 / 21卷 / 37期

基金：

美国国家科学基金会;

关键词：

NANOFLUIDIC CHANNELS; SUPERCRITICAL FLUIDS; THIN-FILMS; FABRICATION; TEMPLATES; SENSORS; POLYMERS;

D O I：

10.1039/c1jm11493j

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Hierarchically structured silica nanochannels were fabricated through the combination of supercritical carbon dioxide mediated silica deposition and nanoimprint lithography of a sacrificial polymer template. Highly-ordered mesoporous silica was prepared with either spherical or cylindrical domain level features, similar to 5-6 nm in diameter, to compliment the device level structure of the embedded nanochannels. The hierarchical structure was used as a test device for low-k dielectric materials with a dielectric constant of 2.0 observed.

引用

页码：14213 / 14218

页数：6

共 34 条

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