Structure evolution in reactively sputtered molybdenum oxide thin films

被引：33

作者：

Pachlhofer, Julia M. ^{[1
]}

Jachs, Christoph ^{[1
]}

Franz, Robert ^{[1
]}

Franzke, Enrico ^{[2
]}

Koestenbauer, Harald ^{[2
]}

Winkler, Joerg ^{[2
]}

Mitterer, Christian ^{[1
]}

机构：

[1] Univ Leoben, Dept Phys Met & Mat Testing, Franz Josef Str 18, A-8700 Leoben, Austria

[2] PLANSEE SE, Business Unit Coating, Metallwerk Plansee Str 71, A-6600 Reutte, Austria

来源：

VACUUM | 2016年 / 131卷

关键词：

Molybdenum oxide; Thin film; MoO2; MoO3; Reactive sputtering; TRANSPARENT; PHOTOCHROMISM;

D O I：

10.1016/j.vacuum.2016.07.002

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The current work investigates structure and property relations of molybdenum oxide thin films deposited by reactive dc magnetron sputtering from a molybdenum target with varying oxygen/argon gas flow ratio during deposition. With increasing oxygen partial pressure, the film growth rate decreased from 90 to 7 nm/min, whereas the oxygen content in the films increased up to 75 at.%. The dominating phases found by X-ray diffraction and Raman spectroscopy were MoO2, different polymorphs of Mo4O11, and MoO3. The optical appearance changed from metallic to yellowish transparent with increasing oxygen content in the thin film, while the electrical properties varied from electrically conductive to insulating. In general, structure and properties of the deposited molybdenum oxide thin films are tuneable by adjusting the oxygen/argon gas flow ratio during deposition, which enables the use of these films in a wide range of optical and electronic applications. (C) 2016 Elsevier Ltd. All rights reserved.

引用

页码：246 / 251

页数：6

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