Activation Energies for Diffusion of Defects in Silicon: The Role of the Exchange-Correlation Functional

被引:29
作者
Estreicher, Stefan K. [1 ]
Backlund, Daniel J. [2 ]
Carbogno, Christian [3 ]
Scheffler, Matthias [3 ]
机构
[1] Texas Tech Univ, Dept Phys, Lubbock, TX 79409 USA
[2] Texas Tech Univ, Hlth Sci Ctr, Lubbock, TX 79409 USA
[3] Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
关键词
defect diffusion; density functional calculations; exchange-correlation functional; semiconductors; silicon; GENERALIZED GRADIENT APPROXIMATION; BOND-CENTERED HYDROGEN; ELASTIC BAND METHOD; CRYSTALLINE SILICON; ANOMALOUS MUONIUM; SADDLE-POINTS; DENSITY; STATE; SYSTEMS; IRON;
D O I
10.1002/anie.201100733
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
DFT calculations were used to determine the activation energies (E a values) for the diffusion of defects such as O atoms (O i 0 red sphere in the picture) in silicon (blue spheres). The migration paths were obtained from the nudged elastic band method. The activation energies calculated with four exchange-correlation functionals (E xc) were compared to experimental data. The E a values of "atomic-like" interstitials are mostly independent of E xc, but those of strongly bound impurities are sensitive to the choice of E xc. © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:10221 / 10225
页数:5
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