High Power Lateral Silicon Carbide Photoconductive Semiconductor Switches and Investigation of Degradation Mechanisms

被引:61
作者
Mauch, Daniel [1 ]
Sullivan, William, III [1 ]
Bullick, Alan [1 ]
Neuber, Andreas [1 ]
Dickens, James [1 ]
机构
[1] Texas Tech Univ, Ctr Pulsed Power & Power Elect, Lubbock, TX 79409 USA
关键词
Photoconducting devices; photoconducting materials; photoconductivity; power semiconductor switches; pulse generation; pulsed-power system switches; semiconductor switches; silicon carbide; CHARGE-LIMITED CURRENTS; DEEP-LEVEL DEFECTS; N-TYPE; 4H; OHMIC CONTACTS; ANNEALING BEHAVIOR; PULSED-POWER; 15; KV; NICKEL; NITROGEN;
D O I
10.1109/TPS.2015.2424154
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Several generations of high power, lateral, linear mode, intrinsically triggered 4H-SiC photoconductive semiconductor switch designs and their performance are presented. These switches were fabricated from high purity semi-insulating 4H-SiC samples measuring 12.7 mm x 12.7 mm x 0.36 mm and were able to block dc electric fields up to 370 kV/cm with leakage currents less than 10 mu A without failure. Switching voltages and currents up to 26 kV and 450 A were achieved with these devices and ON-state resistances of 2 Omega were achieved with 1 mJ of 355 nm laser energy (7 ns FWHM). After fewer than 100 high power switching cycles, these devices exhibited cracks near the metal/SiC interface. Experimental and simulation results investigating the root cause of this failure mechanism are also presented. These results strongly suggest that a transient spike in the magnitude of the electric field at the metal/SiC interface during both switch closing and opening is the dominant cause of the observed cracking.
引用
收藏
页码:2021 / 2031
页数:11
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