X-ray diffraction analysis residual stresses and elasticity constants in thin films

被引：0

作者：

Goudeau, P ^{[1
]}

Renault, PO ^{[1
]}

Badawi, KF ^{[1
]}

Villain, P ^{[1
]}

机构：

[1] Univ Poitiers, UMR 6630 CNRS, Met Phys Lab, F-86962 Futuroscope, France

来源：

VIDE-SCIENCE TECHNIQUE ET APPLICATIONS | 2001年 / 56卷 / 301期

关键词：

x-ray diffraction; residual stresses; elasticity; thin films; microstructure;

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The understanding of physical phenomenon occurring in supported thin films needs a characterisation of both microstructure and mechanical state of elaborated thin films. X-ray diffraction is a powerful technique which allows to manage efficiently both aspects in the case of crystalline materials, When coupling with in-situ tensile tester, one may study elasticity properties of each individual phase of multilayer thin films.

引用

页码：541 / +

页数：25

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