X-ray diffraction analysis residual stresses and elasticity constants in thin films

被引：0
|
作者：
Goudeau, P [1 ]
Renault, PO [1 ]
Badawi, KF [1 ]
Villain, P [1 ]
机构：
[1] Univ Poitiers, UMR 6630 CNRS, Met Phys Lab, F-86962 Futuroscope, France
来源：
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS | 2001年 / 56卷 / 301期
关键词：
x-ray diffraction; residual stresses; elasticity; thin films; microstructure;
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The understanding of physical phenomenon occurring in supported thin films needs a characterisation of both microstructure and mechanical state of elaborated thin films. X-ray diffraction is a powerful technique which allows to manage efficiently both aspects in the case of crystalline materials, When coupling with in-situ tensile tester, one may study elasticity properties of each individual phase of multilayer thin films.
引用
收藏
页码：541 / +
页数：25
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