A novel porous silicon sensor for detection of sub-ppm NO2 concentrations

被引:96
作者
Baratto, C
Faglia, G
Comini, E
Sberveglieri, G
Taroni, A
La Ferrara, V
Quercia, L
Di Francia, G
机构
[1] Univ Brescia, INFM, Gas Sensor Lab, Dept Chem & Phys Engn & Mat, I-25133 Brescia, Italy
[2] ENEA, Natl Res Ctr, I-80055 Portici, NA, Italy
关键词
porous silicon; gas sensor; nitrogen dioxide; impedance spectroscopy; room temperature;
D O I
10.1016/S0925-4005(01)00673-6
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
We developed a new technique for the deposition of free-standing porous silicon (PS) on alumina substrate with interdigital contacts (Italian Patent ENEA-INFM), thus removing the silicon substrate, that is inactive in gas detection and is much more conductive than PS. The de and ac electrical measurements in a controlled atmosphere were performed to test the sensor response towards NO2 (0.1-10 ppm), O-3 (200 ppb), CO (1000 ppm), benzene (20 ppm), organic vapours and humidity. The device was able to detect very low concentrations of nitrogen dioxide (100 ppb) with no interference from ozone, benzene, CO and organic vapours. Indeed humidity interferes with nitrogen dioxide detection and must be kept under control. Since PS showed great response to NO2 at room temperature (RT), no heating of the sensor is required. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:62 / 66
页数:5
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