Dwell time considerations for large area Cold Plasma decontamination

被引:7
|
作者
Konesky, Gregory [1 ]
机构
[1] K Plasma Ltd, Hampton Bays, NY 11946 USA
关键词
Decontamination; Large Area Applicator; Non-Thermal Plasma; Cold Plasma; Dwell Time; Plasma Jet; BACILLUS-SUBTILIS; WARFARE; AGENTS; STERILIZATION;
D O I
10.1117/12.818323
中图分类号
TP7 [遥感技术];
学科分类号
081102 ; 0816 ; 081602 ; 083002 ; 1404 ;
摘要
Atmospheric discharge cold plasmas have been shown to be effective in the reduction of pathogenic bacteria and spores and in the decontamination of simulated chemical warfare agents, without the generation of toxic or harmful by-products. Cold plasmas may also be useful in assisting cleanup of radiological "dirty bombs." For practical applications in realistic scenarios, the plasma applicator must have both a large area of coverage, and a reasonably short dwell time. However, the literature contains a wide range of reported dwell times, from a few seconds to several minutes, needed to achieve a given level of reduction. This is largely due to different experimental conditions, and especially, different methods of generating the decontaminating plasma. We consider these different approaches and attempt to draw equivalencies among them, and use this to develop requirements for a practical, field-deployable plasma decontamination system. A plasma applicator with 12 square inches area and integral high voltage, high frequency generator is described.
引用
收藏
页数:10
相关论文
共 50 条
  • [41] Application of cold argon plasma on germination, root length, and decontamination of soybean cultivars
    Sayahi, Khadijeh
    Sari, Amir Hossein
    Hamidi, Aidin
    Nowruzi, Bahareh
    Hassani, Farshid
    BMC PLANT BIOLOGY, 2024, 24 (01)
  • [42] Decontamination of deoxynivalenol in Indica rice by cold plasma and the determination of major degradation products
    Huang, Shijia
    Li, Ling
    Zhou, Guoxin
    Liu, Xingquan
    Guo, Jian
    FOOD CONTROL, 2025, 173
  • [43] On-demand cold plasma activation of acetyl donors for bacteria and virus decontamination
    Szili, Endre J.
    Ghimire, Bhagirath
    Patenall, Bethany Lee
    Rohaim, Mohammed
    Mistry, Dharmit
    Fellows, Adrian
    Munir, Muhammad
    Jenkins, A. Toby A.
    Short, Robert D.
    APPLIED PHYSICS LETTERS, 2021, 119 (05)
  • [44] Microbial decontamination of black peppercorns by simultaneous treatment with cold plasma and ultraviolet C
    Bang, In Hee
    Kim, Ye Eun
    Lee, Seung Young
    Min, Sea C.
    INNOVATIVE FOOD SCIENCE & EMERGING TECHNOLOGIES, 2020, 63
  • [45] Optimization of the Radiofrequency Low-Pressure Cold Plasma Conditions for Decontamination of Saffrons
    Khodabandeh, Mahsa
    Azizi, Majid
    Shokri, Babak
    Bahreini, Masoumeh
    Rezadoost, Hasan
    Salehi, Mohammad
    FOOD AND BIOPROCESS TECHNOLOGY, 2024, 17 (01) : 271 - 297
  • [46] Decontamination of Red Pepper Using Cold Atmospheric Pressure Plasma as Alternative Technique
    Abdi, Soheila
    Hosseini, Ashrafalsadat
    Moslehishad, Maryam
    Dorranian, Davoud
    APPLIED FOOD BIOTECHNOLOGY, 2019, 6 (04) : 247 - 254
  • [47] Cold Plasma Rapid Decontamination of Food Contact Surfaces Contaminated with Salmonella Biofilms
    Niemira, Brendan A.
    Boyd, Glenn
    Sites, Joseph
    JOURNAL OF FOOD SCIENCE, 2014, 79 (05) : M917 - M922
  • [48] Optimization of the Radiofrequency Low-Pressure Cold Plasma Conditions for Decontamination of Saffrons
    Mahsa Khodabandeh
    Majid Azizi
    Babak Shokri
    Masoumeh Bahreini
    Hasan Rezadoost
    Mohammad Salehi
    Food and Bioprocess Technology, 2024, 17 : 271 - 297
  • [49] Application of cold argon plasma on germination, root length, and decontamination of soybean cultivars
    Khadijeh Sayahi
    Amir Hossein Sari
    Aidin Hamidi
    Bahareh Nowruzi
    Farshid Hassani
    BMC Plant Biology, 24
  • [50] Cold atmospheric pressure plasma decontamination of allspice berries and effect on qualitative characteristics
    Veronika Medvecká
    Silvia Mošovská
    Anna Mikulajová
    Ľubomír Valík
    Anna Zahoranová
    European Food Research and Technology, 2020, 246 : 2215 - 2223