Two-photon exposure of photographic film

被引：3

作者：

Wu, PW ^{[1
]}

Dunn, B

Yablonovitch, E

Doan, V

Schwartz, BJ

机构：

[1] Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USA

[2] Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USA

[3] Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS | 1999年 / 16卷 / 04期

关键词：

D O I：

10.1364/JOSAB.16.000605

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Photographic film has commonly been exposed by a single-photon absorption mechanism. We determine the conditions for film exposure by direct two-photon absorption. Using subpicosecond laser pulses, we find that two-photon exposure for commercial film has a threshold fluence and an intensity of 0.0008 J/cm(2) and 0.0066 TW/cm(2), respectively, well below the optical damage threshold. Multiphoton photography has the potential for higher spatial resolution and affords an opportunity for three-dimensional image storage. (C) 1999 Optical Society of America [S0740-3224(99)00304-5] OCIS codes: 190.4180, 110.5200.

引用

页码：605 / 608

页数：4

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