The mechanism and process of nanosecond pulsed-laser induced dsubwavelength periodic ripples on silica films

被引：11

作者：

Xia, Zhilin ^{[1
,2
]}

Chen, Cheng ^{[1
]}

Fang, Hong ^{[1
]}

Chen, Shi ^{[3
]}

机构：

[1] Wuhan Univ Technol, Sch Mat Sci & Engn, Wuhan 430070, Hubei, Peoples R China

[2] Wuhan Univ Technol, State Key Lab Silicate Mat Architectures, Wuhan 430070, Hubei, Peoples R China

[3] Wuhan Univ Technol, Sch Informat Engn, Wuhan 430070, Hubei, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2015年 / 337卷

基金：

中国国家自然科学基金;

关键词：

Silica films; Laser induced damage; Subwavelength ripples; Nanosecond pulsed laser; FEMTOSECOND LASER; SURFACE-STRUCTURES; BREAKDOWN;

D O I：

10.1016/j.apsusc.2015.02.082

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The discovery of subwavelength periodic ripples with similar grating structures is currently mainly associated with femto-/picosecond laser ablation experiments. A nanosecond laser is generally accepted as incapable of etching subwavelength periodic ripples. Recently, the subwavelength periodic ripples on the surface of silica films induced by nanosecond laser pulses have been observed. In this paper, theoretical models have been established to interpret the formation process of subwavelength periodic ripples etched by nanosecond pulsed laser, and some key questions have been discussed. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：151 / 157

页数：7

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