SiC field effect transistor technology demonstrating prolonged stable operation at 500 °C

被引:19
作者
Neudeck, Philip G. [1 ]
Spry, David J. [2 ]
Chen, Liang-Yu [2 ]
Okojie, Robert S. [1 ]
Beheim, Glenn M. [1 ]
Meredith, Roger [1 ]
Ferrier, Terry [1 ]
机构
[1] NASA, Glenn Res Ctr, 21000 Brookpk Rd,MS 77-1, Cleveland, OH 44135 USA
[2] NASA Glenn, OAI, Cleveland, OH 44135 USA
来源
SILICON CARBIDE AND RELATED MATERIALS 2006 | 2007年 / 556-557卷
关键词
high temperature; MESFET; amplifier; packaging; durability; reliability;
D O I
10.4028/www.scientific.net/MSF.556-557.831
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
While there have been numerous reports of short-term transistor operation at 500 degrees C or above, these devices have previously not demonstrated sufficient long-term operational durability at 500 degrees C to be considered viable for most envisioned applications. This paper reports the development of SiC field effect transistors capable of long-term electrical operation at 500 degrees C. A 6H-SiC MESFET was packaged and subjected to continuous electrical operation while residing in a 500 degrees C oven in oxidizing air atmosphere for over 2400 hours. The transistor gain, saturation current (loss), and on-resistance (R-DS) changed by less than 20% from initial values throughout the duration of the biased 500 degrees C test. Another high-temperature packaged 6H-SiC MESFET was employed to form a simple one-stage high-temperature low-frequency voltage amplifier. This single-stage common-source amplifier demonstrated stable continuous electrical operation (negligible changes to gain and operating biases) for over 600 hours while residing in a 500 degrees C air ambient oven. In both cases, increased leakage from annealing of the Schottky gate-to-channel diode was the dominant transistor degradation mechanism that limited the duration of 500 degrees C electrical operation.
引用
收藏
页码:831 / +
页数:2
相关论文
共 4 条
[1]  
CHEN LY, 2006, P 2006 IMAPS INT HIG, P240
[2]  
McCluskey F. P., 1997, HIGH TEMPERATURE ELE
[3]  
OKOJIE RS, 2000, MAT RES SOC S P, V622
[4]  
SPRY DJ, 2004, P 2004 IMAPS INT C H