Non-linear imprint behavior of PZT thin films

被引:19
作者
Schorn, P [1 ]
Ellerkmann, U [1 ]
Bolten, D [1 ]
Boettger, U [1 ]
Waser, R [1 ]
机构
[1] Univ Technol Aachen, Inst Werkstoffe Elektrotech, D-52056 Aachen, Germany
关键词
PZT; CSD; thin films; ferroelectric properties; non-linear imprint;
D O I
10.1080/10584580390258282
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Ferroelectric thin film capacitors are promising candidates for non-volatile ferroelectric Random Access Memories (FeRAM's) as they exhibit a switchable polarization. There are three important failure-mechanisms influencing the performance of these capacitors and disturbing the long-term stability and reliability under operation conditions fatigue, retention, and imprint. The imprint effect of lead zirconate titanate (PZT) thin films was investigated in this paper. Establishing and maintaining a polarization state leads to a shift of the hysteresis loop on the voltage axis and also to a loss of polarization. The voltage shift as well as the loss of polarization can cause a failure of the ferroelectric memory cell (read and write failure). The experimental results obtained on PZT films are discussed in view of the predictions of imprint models proposed in the literature.
引用
收藏
页码:361 / 369
页数:9
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