Hard amorphous carbon-fluorine films deposited by PECVD using C2H2-CF4 gas mixtures as precursor atmospheres

被引：27
作者：
Jacobsohn, LG
da Costa, MEHM
Trava-Airoldi, W
Freire, E
机构：
[1] Pontificia Univ Catolica Rio de Janeiro, Dept Fis, BR-22453900 Rio De Janeiro, RJ, Brazil
[2] Inst Nacl Pesquisas Espaciais, BR-12201970 Sao Jose Dos Campos, SP, Brazil
来源：
DIAMOND AND RELATED MATERIALS | 2003年 / 12卷 / 10-11期
关键词：
amorphous hydrogenated carbon; fluorine; structure; mechanical properties;
D O I：
10.1016/S0925-9635(03)00200-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
An investigation of the structural arrangement and mechanical properties of a-C:F:H films obtained by plasma enhanced chemical vapor deposition (PECVD) using C2H2-CF4 gas mixtures as precursor atmospheres was carried out. The results indicate that fluorine incorporation increases the hydrophobicity of the films and relaxes the internal stress, while reducing the hardness also. It was shown that it is possible to obtain fluorinated carbon films with hydrophobicity comparable to that of polytetrafluoroethylene (TFE) but with much higher hardness, that is in the range of a few GPa. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：2037 / 2041
页数：5
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