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Measurement of negative ion fluxes during DC reactive magnetron sputtering of Ti in Ar/O2 atmosphere using a magnetic-filtering probe
被引:6
作者:
Poolcharuansin, Phitsanu
[1
]
Chingsungnoen, Artit
[1
]
Pasaja, Nitisak
[1
]
Horprathum, Mati
[2
]
Bradley, James W.
[3
]
机构:
[1] Mahasarakham Univ, Dept Phys, Technol Plasma Res Unit, Maha Sarakham 44150, Thailand
[2] Natl Elect & Comp Technol Ctr, Spectroscop & Sensing Devices Res Grp, Pathum Thani 12120, Thailand
[3] Univ Liverpool, Dept Elect Engn & Elect, Liverpool L69 3GJ, Merseyside, England
来源:
关键词:
Reactive magnetron sputtering;
Negative ions;
Ion flux probe;
Target poisoning;
ENERGETIC OXYGEN IONS;
THIN-FILMS;
TARGET;
DEPOSITION;
OXIDE;
DISTRIBUTIONS;
ALUMINUM;
DENSITY;
PLASMA;
D O I:
10.1016/j.vacuum.2021.110549
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
The flux of negative oxygen ions in a dc reactive magnetron discharge has been measured using a specially developed magnetic-filtering probe. The gridded probe which operates as a retarding field analyzer has a magnetic filter attached to the front entrance to suppress plasma electrons entering the device. As a result, the fluxes of unmagnetized negative ions with energies of higher than similar to 10 eV can arrive to an ion collector and contribute to the detected probe current. During the oxide mode of Ti-Ar/O-2 magnetron sputtering discharge, the measured negative ion flux is considered to be contributed by the sputtered O- ions generated at the target surface and the plasma O- ions created in the discharge volume. However, in specific discharge conditions, the sputtered ions are likely to dominate in the measured flux signal. As a result, the yield of the sputtered O- ions and associated energy flux can be examined. The magnetic-filtering probe could potentially be employed as a real-time diagnostic tool to monitor the sputtered O- flux as well as the oxide state of the target surface during reactive magnetron sputtering processes.
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页数:10
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