Bilateral comparison of 1 Ω and 10 kΩ; standards (ongoing BIPM key comparisons BIPM.EM-K13.a and 13.b) between the NPLI (India) and the BIPM

被引：0

作者：

Fletcher, N. ^{[1
]}

Goebel, R. ^{[1
]}

Saleem, M. ^{[2
]}

Singh, H. K. ^{[2
]}

Ansari, M. A. ^{[2
]}

Kiran, U. ^{[2
]}

Saxena, A. K. ^{[2
]}

机构：

[1] BIPM, Pavillon Breteuil, F-92310 Sevres, France

[2] NPLI, Dr KS Krishnan Rd, New Delhi 12, India

来源：

METROLOGIA | 2019年 / 56卷 / 1A期

关键词：

Resistance; ohm; CIPM MRA; comparison; K13; electricity;

D O I：

10.1088/0026-1394/56/1A/01007

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

This report gives the result of a bilateral comparison of resistance between the NPLI (India) and the BIPM carried out in 2012-2013. Two 1 Omega and two 10 k Omega travelling standards belonging to the BIPM were used. The comparison was carried out with an 'A-B-A' pattern of measurements. The standards were measured first at the BIPM for a period of about three months, then for a period of about two months at the NPLI, and finally again at the BIPM. The measurand was the 4 terminal dc resistance at low power. The BIPM was the pilot laboratory, and the comparison forms part of the ongoing BIPM key comparisons BIPM.EM-K13.a (for 1 Omega) and BIPM.EM-K13.b (for 10 k Omega). The results from the NPLI and the BIPM were found to be in agreement, with a difference smaller than the relative expanded uncertainty (95 % confidence, k = 2) of 0.52 x 10(-6) for 1 Omega and 0.28 x 10(-6) for 10 k Omega.

引用

页数：2