Determination of interfacial roughness and its correlation in sputtered CoZr/Cu multilayers

被引：0

作者：

Langer, J

Mattheis, R

Krausslich, J

Senz, S

Hesse, D

Schuhrke, T

Zweck, J

机构：

[1] IPHT Jena eV, D-07702 Jena, Germany

[2] Univ Jena, IOQ, D-07743 Jena, Germany

[3] Max Planck Inst Mikrostrukturphys, D-06120 Halle, Germany

[4] Univ Regensburg, Inst Expt & Angew Phys, D-93040 Regensburg, Germany

来源：

THIN SOLID FILMS | 1998年 / 319卷 / 1-2期

关键词：

X-ray reflectometry; Hurst parameter; interfacial roughness; multilayers; root mean square;

D O I：

10.1016/S0040-6090(97)01119-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We relate the information about interfacial roughness in multilayers obtained by X-ray reflectometry in the low angle regime to what can be determined from cross-section images taken in a transmission electron microscope (TEM). The interfacial root mean square (rms) roughness for each individual layer can be derived from X-ray reflectometry in specular geometry in Co/Cu multilayer systems. The results are both qualitatively and quantitatively in agreement with results obtained by evaluating cross-section TEM images. Utilising non-specular scans in X-ray reflectometry gives additional details about the growth structure. In Co1-xZrx/Cu multilayers we suggest to correlate the Hurst parameter to the grain structure determined by cross-sectional TEM. (C) 1998 Elsevier Science S.A.

引用

页码：187 / 190

页数：4

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