Ultrafast Polymerization Inhibition by Stimulated Emission Depletion for Three-dimensional Nanolithography

被引：49
作者：
Fischer, Joachim [1 ,2 ]
Wegener, Martin [1 ,2 ,3 ]
机构：
[1] KIT, Inst Angew Phys, D-76131 Karlsruhe, Germany
[2] KIT, DFG Ctr Funct Nanostruct CFN, D-76131 Karlsruhe, Germany
[3] KIT, Inst Nanotechnol, D-76344 Eggenstein Leopoldshafen, Germany
来源：
ADVANCED MATERIALS | 2012年 / 24卷 / 10期
关键词：
direct laser writing; 3D lithography; nanofabrication; superresolution; stimulated emission depletion; FLUORESCENCE MICROSCOPY; OPTICAL LITHOGRAPHY; RESOLUTION; PHOTOPOLYMERIZATION; LIMIT;
D O I：
10.1002/adma.201103758
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
To identify the depletion mechanism in the stimulated-emission-depletion (STED) inspired photoresist composed of a ketocoumarin photoinitiator in pentaerythritol tetraacrylate, we perform lithography with pulsed excitation and tunable delayed depletion. A fast component can unambiguously be assigned to stimulated emission. Our results allow the systematical optimization of the conditions in next-generation STED direct-laser-writing optical lithography. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码：OP65 / OP69
页数：5
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