150-GHz RF SOI-CMOS Technology in Ultrathin Regime on Organic Substrate

被引:18
作者
des Etangs-Levallois, Aurelien Lecavelier [1 ]
Dubois, Emmanuel [1 ]
Lesecq, Marie [1 ]
Danneville, Francois [1 ]
Poulain, Laurent [1 ]
Tagro, Yoann [1 ]
Lepilliet, Sylvie [1 ]
Gloria, Daniel [2 ]
Raynaud, Christine [2 ]
Troadec, David [1 ]
机构
[1] CNRS, Inst Elect & Microelect & Nanotechnol, UMR 8520, F-59652 Villeneuve Dascq, France
[2] STMicroelectronics, F-38920 Crolles, France
关键词
CMOS; organic substrate; plastic; thin film; THIN-FILM-TRANSISTOR; FLEXIBLE SUBSTRATE;
D O I
10.1109/LED.2011.2166241
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This letter provides an experimental demonstration of high-performance industrial MOSFETs thinned down to 5.7 mu m and transferred onto a 125-mu m-thick polyethylene naphthalate foil. The die stack transferred onto the organic substrate comprises the 200-nm-thick active layer and the 5.5-mu m-thick interconnection multilayer stack resulting in a light, compact, and bendable thin film. We unveil that dc and RF performances are invariant even for ultimate thinning down to the buried oxide layer. Furthermore, n-MOSFET performance is improved by 1.5x compared with previous work, and the first demonstration of 100-GHz p-MOSFETs on an organic substrate is presented. Unity-current-gain cutoff and maximum oscillation frequencies as high as 150/160 GHz for n-MOSFETs and 100/130 GHz for p-MOSFETs on a plastic substrate have been measured, respectively.
引用
收藏
页码:1510 / 1512
页数:3
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