Microstructure and nanoindentation hardness of Ti/TiN multilayered films

被引：66
|
作者：
Li, TS [1 ]
Li, H [1 ]
Pan, F [1 ]
机构：
[1] Tsing Hua Univ, Dept Mat Sci & Engn, Adv Mat Lab, Beijing 100084, Peoples R China
来源：
SURFACE & COATINGS TECHNOLOGY | 2001年 / 137卷 / 2-3期
关键词：
Ti/TiN multilayers; hardness enhancement; microstructure;
D O I：
10.1016/S0257-8972(00)01096-3
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Ti/TiN multilayered films were deposited by a reactive magnetron sputtering method using a combination of a Ti target and an Ar-N-2 mixture discharge gas. The microstructure and nanoindentation hardness was characterized by various methods. The experimental results indicated that the hardness of multilayered film depends on both the modulation period and the thickness ratio between Ti and TiN layers lambda (Ti/TiN). The hardness was considerably enhanced when the modulation period was in the range 35-60 nm for lambda (Ti/TiN) = 1:1 and it was up to 23 GPa. For lambda (Ti/TiN) = 1:3, the hardness enhancement appears in the films with the modulation period of 20-70 nm. The possible mechanism responsible for the modification of the hardness and periods of films is also discussed. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：225 / 229
页数：5
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