Visualization and damage due to nano-dendrite defects in metal-insulator-metal capacitors

被引:0
|
作者
Sheng, Lieyi [1 ]
Snyder, Eric [1 ]
Steidley, Shane [1 ]
Sierra, Anna [1 ]
Glines, Eddie [1 ]
机构
[1] AMI Semicond, Pocatello, ID 83201 USA
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:649 / 650
页数:2
相关论文
共 50 条
  • [1] Charging damage in floating metal-insulator-metal capacitors
    Ackaert, J
    Wang, ZC
    De Backer, E
    Coppens, P
    2001 6TH INTERNATIONAL SYMPOSIUM ON PLASMA- AND PROCESS-INDUCED DAMAGE, 2001, : 120 - 123
  • [2] Plasma damage in floating metal-insulator-metal capacitors
    Ackaert, J
    Wang, ZC
    De Backer, E
    Coppens, P
    PROCEEDINGS OF THE 2001 8TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS, 2001, : 224 - 227
  • [3] Plasma damage considerations involving Metal-Insulator-Metal (MIM) capacitors
    O'Connell, B
    Thibeault, T
    Chaparala, P
    2004 INTERNATIONAL CONFERENCE ON INTEGRATED CIRCUIT DESIGN AND TECHNOLOGY, 2004, : 123 - 126
  • [4] UNIQUE ELECTRICAL CHARACTERIZATION AND IN-LINE MONITORING OF NANO-TIPPED DEFECTS IN METAL-INSULATOR-METAL CAPACITORS
    Sheng, Lieyi
    Snyder, Eric
    Doub, Jason
    Berti, Valerie
    Kriner, Levi
    Glines, Eddie
    2009 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, VOLS 1 AND 2, 2009, : 808 - 809
  • [5] Design and characterization of metal-insulator-metal metal finger capacitors
    Subramaniam, Kalavathi
    Kordesch, Albert Victor
    Esa, Mazlina
    2007 INTERNATIONAL CONFERENCE ON MICROELECTRONICS, 2007, : 150 - +
  • [6] Temperature dependence of TaAlOx metal-insulator-metal capacitors
    Hota, M. K.
    Mallik, S.
    Sarkar, C. K.
    Maiti, C. K.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2011, 29 (01):
  • [7] Characteristics of Cerium Oxide for Metal-Insulator-Metal Capacitors
    Cheng, C. H.
    Hsu, H. H.
    Chen, W. B.
    Chin, Albert
    Yeh, F. S.
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2010, 13 (01) : II16 - II19
  • [8] Reliability of gate dielectrics and metal-insulator-metal capacitors
    Martin, A
    MICROELECTRONICS RELIABILITY, 2005, 45 (5-6) : 834 - 840
  • [9] Sample Preparation methodology for ultra thin oxide damage in Metal-Insulator-Metal capacitors
    Calvagno, Giancarlo
    Muni, Giuseppe
    Jossa, Andrea
    Mello, Domenico
    MICROELECTRONICS RELIABILITY, 2012, 52 (9-10) : 2064 - 2067
  • [10] Reliability Studies on Thin Metal-Insulator-Metal (MIM) Capacitors
    Hamada, Dorothy June M.
    Roesch, William J.
    2008 ROCS WORKSHOP, PROCEEDINGS, 2008, : 57 - 61