Photoreflectance characterization of InP/GaAsSb double-heterojunction bipolar transistor epitaxial wafers

被引:1
|
作者
Sugiyama, H
Oda, Y
Kobayashi, T
Uchida, M
Watanabe, N
机构
[1] NTT Corp, NTT Photon Labs, Atsugi, Kanagawa 2430198, Japan
[2] NTT Adv Technol Corp, Atsugi, Kanagawa 2430198, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2005年 / 23卷 / 03期
关键词
D O I
10.1116/1.1924423
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report photoreflectance (PR) measurements of InP/GaAsSb double-heterojunction bipolar transistor epitaxial wafers grown by metalorganic vapor-phase epitaxy and discuss the correlation between the spectra and the electrical characteristics of the emitter-base (E/B) heterojunctions. The origin of Franz-Keldysh oscillations (FKOs) in the PR spectra was identified by step etching of the samples. The current-voltage characteristics of the E/B heterojunctions were examined by fabricating devices. FKOs from both the emitter and collector regions were observed in the wafers where the recombination forward current at the E/B heterojunction was suppressed. In contrast, when the recombination current was significant, no emitter-related FKOs were observed. The absence of the FKOs from the emitter indicates the high concentration of recombination centers at the EIB heterojunction. (c) 2005 American Vacuum Society.
引用
收藏
页码:1004 / 1009
页数:6
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