Structural and optical properties of SnO2 films grown on α-Al2O3(0001) by MOCVD

被引：23

作者：

Feng, Xianjin ^{[1
]}

Ma, Jin ^{[1
]}

Yang, Fan ^{[1
]}

Ji, Feng ^{[1
]}

Luan, Caina ^{[1
]}

Ma, Honglei ^{[1
]}

机构：

[1] Shandong Univ, Sch Phys & Microelect, Jinan 250100, Peoples R China

来源：

JOURNAL OF CRYSTAL GROWTH | 2008年 / 310卷 / 02期

基金：

中国国家自然科学基金;

关键词：

crystal structure; X-ray diffraction; metalorganic chemical vapor deposition; semiconduting II-VI materials;

D O I：

10.1016/j.jcrysgro.2007.10.039

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

High-quality single crystalline SnO2 films have been prepared on alpha-Al2O3(0 0 0 1) substrates by the metalorganic chemical vapor deposition (MOCVD) method. Structural and optical properties of the SnO2 films prepared at different substrate temperatures (500-800 degrees C) were investigated in detail. The obtained films were pure SnO2 with the tetragonal rutile structure. The film prepared at 600 degrees C showed the best single crystalline structure with a single orientation along a-axis. The average transmittance for the SnO2 films in the visible range was over 90% with a minimum optical gap of 3.58 eV. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：295 / 298

页数：4

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