Mechanophotopatterning on a Photoresponsive Elastomer

被引：124

作者：

Kloxin, Christopher J. ^{[1
]}

Scott, Timothy F. ^{[1
]}

Park, Hee Young ^{[1
]}

Bowman, Christopher N. ^{[1
]}

机构：

[1] Univ Colorado, Dept Chem & Biol Engn, Boulder, CO 80309 USA

来源：

ADVANCED MATERIALS | 2011年 / 23卷 / 17期

基金：

美国国家科学基金会; 美国国家卫生研究院;

关键词：

CROSS-LINKED POLYMERS; THIN-FILMS; WRINKLES;

D O I：

10.1002/adma.201100323

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Photopatterning of a photoreversible covalent elastomeric network under mechanical :train, or mechanophotopatterning, provides a facile approach to fabricate complex topographical features using elementary irradiation schemes. A photoresponsive material is deformed in two dimensions and irradiated through a mask, resulting in a transparent material with topography that reflects the concentric rings of the mask.

引用

页码：1977 / 1981

页数：5

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