Atmospheric pressure plasma jet processed reduced graphene oxides for supercapacitor application

被引：34

作者：

Kuok, Fei-Hong ^{[1
]}

Liao, Chen-Yu ^{[1
]}

Wan, Ting-Hao ^{[1
]}

Yeh, Po-Wei ^{[2
]}

Cheng, I-Chun ^{[3
,4
]}

Chen, Jian-Zhang ^{[1
]}

机构：

[1] Natl Taiwan Univ, Grad Inst Appl Mech, 1 Sec 4 Roosevelt Rd, Taipei 10617, Taiwan

[2] Natl Taiwan Univ, Dept Chem Engn, Taipei 10617, Taiwan

[3] Natl Taiwan Univ, Grad Inst Photon & Optoelect, Taipei 10617, Taiwan

[4] Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2017年 / 692卷

关键词：

NANOPOROUS TIO2 PHOTOANODES; SENSITIZED SOLAR-CELLS; GLOW-DISCHARGE PLASMA; THIN-FILMS; COUNTER-ELECTRODES; ULTRAFAST SYNTHESIS; POROUS CARBON; AIR; DEPOSITION; STORAGE;

D O I：

10.1016/j.jallcom.2016.09.056

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We successfully demonstrate reduced graphene oxides supercapacitors processed by atmospheric pressure plasma jets. The optimized processing time is merely 15 s. The best specific capacitance achieved is similar to 274 F g(-1) as evaluated by cyclic voltammetry under a potential scan rate of 2 mV s(-1). The specific capacitance decreases from similar to 203 F g(-1) at cycle 1 to similar to 168 F g(-1) at cycle 2000 in a cycling stability test evaluated under a potential scan rate of 200 mV s (-1). (C) 2016 Elsevier B.V. All rights reserved.

引用

页码：558 / 562

页数：5

共 50 条

[21] Characteristic and Application Study of Cold Atmospheric-Pressure Nitrogen Plasma Jet [J].

Liu, Xin ;

Chen, Faze ;

Huang, Shuai ;

Yang, Xiaolong ;

Lu, Yao ;

Zhou, Wenlong ;

Xu, Wenji .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 2015, 43 (06) :1959-1968

[22] Growth of silicon oxynitride films by atmospheric pressure plasma jet [J].

Zhang, Xueqiang ;

Ptasinska, Sylwia .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2014, 47 (14)

[23] Atmospheric pressure plasma jet for decontamination purposes [J].

Pawlat, Joanna .

EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2013, 61 (02)

[24] Rapid Atmospheric-Pressure-Plasma-Jet Processed Porous Materials for Energy Harvesting and Storage Devices [J].

Chen, Jian-Zhang ;

Hsu, Cheng-Che ;

Wang, Ching ;

Liao, Wei-Yang ;

Wu, Chih-Hung ;

Wu, Ting-Jui ;

Liu, Hsiao-Wei ;

Chang, Haoming ;

Lien, Shao-Tzu ;

Li, Hsin-Chieh ;

Hsu, Chun-Ming ;

Kao, Peng-Kai ;

Yang, Yao-Jhen ;

Cheng, I-Chun .

COATINGS, 2015, 5 (01) :26-38

[25] Ultrafast synthesis of continuous Au thin films from chloroauric acid solution using an atmospheric pressure plasma jet [J].

Wu, Ting-Jui ;

Chou, Chia-Yun ;

Hsu, Chun-Ming ;

Hsu, Cheng-Che ;

Chen, Jian-Zhang ;

Cheng, I-Chun .

RSC ADVANCES, 2015, 5 (121) :99654-99657

[26] Enhanced lithium intercalation and conduction in LiαFeTaxOyCzfilms by the addition of lithium oxides with an atmospheric pressure plasma jet [J].

Lin, Yung-Sen ;

Shie, Bing-Shiun ;

Lai, Yan-Hong ;

Hu, Jhen-Yu ;

Chen, Hsiang ;

Lin, Chia-Feng .

JOURNAL OF SOLID STATE ELECTROCHEMISTRY, 2021, 25 (01) :247-266

[27] Double-Layered Atmospheric Pressure Plasma Jet [J].

Choi, Jaegu ;

Matsuo, Keita ;

Yoshida, Hidekazu ;

Namihira, Takao ;

Katsuki, Sunao ;

Akiyama, Hidenori .

JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (08) :0860031-0860033

[28] Atmospheric pressure plasma jet for liquid spray treatment [J].

Mitic, S. ;

Philipps, J. ;

Hofmann, D. .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (20)

[29] The preliminary study of etching characteristics of atmospheric pressure trifluoromethane plasma jet etching [J].

Sung, Yu-Ching ;

Yang, Wen-Lin ;

Huang, Chun .

JAPANESE JOURNAL OF APPLIED PHYSICS, 2024, 63 (10)

[30] Atmospheric pressure plasma jet annealed ZnO films for MgZnO/ZnO heterojunctions [J].

Lien, Shao-Tzu ;

Li, Hsin-Chieh ;

Yang, Yao-Jhen ;

Hsu, Cheng-Che ;

Cheng, I-Chun ;

Chen, Jian-Zhang .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (07)

← 1 2 3 4 5 →