Atmospheric pressure plasma jet processed reduced graphene oxides for supercapacitor application

被引：34
作者：
Kuok, Fei-Hong [1 ]
Liao, Chen-Yu [1 ]
Wan, Ting-Hao [1 ]
Yeh, Po-Wei [2 ]
Cheng, I-Chun [3 ,4 ]
Chen, Jian-Zhang [1 ]
机构：
[1] Natl Taiwan Univ, Grad Inst Appl Mech, 1 Sec 4 Roosevelt Rd, Taipei 10617, Taiwan
[2] Natl Taiwan Univ, Dept Chem Engn, Taipei 10617, Taiwan
[3] Natl Taiwan Univ, Grad Inst Photon & Optoelect, Taipei 10617, Taiwan
[4] Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan
来源：
JOURNAL OF ALLOYS AND COMPOUNDS | 2017年 / 692卷
关键词：
NANOPOROUS TIO2 PHOTOANODES; SENSITIZED SOLAR-CELLS; GLOW-DISCHARGE PLASMA; THIN-FILMS; COUNTER-ELECTRODES; ULTRAFAST SYNTHESIS; POROUS CARBON; AIR; DEPOSITION; STORAGE;
D O I：
10.1016/j.jallcom.2016.09.056
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We successfully demonstrate reduced graphene oxides supercapacitors processed by atmospheric pressure plasma jets. The optimized processing time is merely 15 s. The best specific capacitance achieved is similar to 274 F g(-1) as evaluated by cyclic voltammetry under a potential scan rate of 2 mV s(-1). The specific capacitance decreases from similar to 203 F g(-1) at cycle 1 to similar to 168 F g(-1) at cycle 2000 in a cycling stability test evaluated under a potential scan rate of 200 mV s (-1). (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码：558 / 562
页数：5
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