Photo-Fries-based photosensitive polymeric interlayers for patterned organic devices

This work reports on the investigation of the photosensitive polymer poly(diphenyl bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylate) (PPNB), which undergoes the photo-Fries rearrangement upon illumination with UV-light, used as interfacial layers in organic electronic devices. Two cases were investigated: the use of a blend of PPNB with poly-vinylcarbazole (PVK) as an interlayer in para-sexiphenyl (PSP) based organic light emitting diodes (OLEDs) and the use of PPNB as gate dielectric layer in organic field effect transistors (OFETs). The photo-Fries rearrangement reaction causes a change of the polymer chemical structure resulting in a change of its physical and chemical properties. The electroluminescence spectra and emission of the PSP OLEDs are not affected when fabricated with a non-UV-illuminated PPNB:PVK blend. However, the electroluminescence is totally quenched in those OLEDs fabricated with UV-illuminated PPNB:PVK blend. Although the dielectric constant of PPNB increases upon UV-treatment, it is demonstrated that those OFETs built with UV-treated PPNB as gate dielectric have lower performance than those OFETs built with non-UV-treated PPNB. Furthermore, the effect of the UV-illumination of PPNB and PPNB:PVK blend on the growth of the small molecules C-60 and PSP has been studied by atomic force microscopy. Using photolithography, this kind of photochemistry can be performed to spatially control and tune the optical and electrical performance of organic electronic devices.