Effect of setpoint on CD measurement in CD-AFM:TB plausibility study

被引:0
作者
Park, B. C. [1 ]
Choi, J. [1 ]
Ahn, S. J. [1 ]
Shin, M-j [2 ]
Ihm, D-c [2 ]
Lee, B-h [2 ]
机构
[1] Korea Res Inst Stand & Sci, Taejon 305600, South Korea
[2] Samsung Elect Co Ltd, Samsung R&D Ctr, Memory Business Div, Suwon, South Korea
来源
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXII, PTS 1 AND 2 | 2008年 / 6922卷 / 1-2期
关键词
critical dimension atomic force microscope (CD-AFM); amplitude setpoint; shear interaction; critical dimension (CD) metrology; linewidth; sidewall;
D O I
10.1117/12.773230
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
The amplitude setpoint affects the critical dimension measurement with CD-AFM. The setpoint amplitude is the amplitude of the resonant oscillation of the AFM tip maintained by the feedback loop as it scans the surface. The Setpoint therefore decides the tip-surface distance, and the tip-surface interaction force as well. Normally, the tip moves an unknown distance away from the sample surface. Such a tip-sample distance on the top and bottom surface is cancelled out in height measurement. In width measurement, however, the tip-sample distance on the left and right sidewall will add up to produce a bias in the measured CD values. The bias will appear in the opposite way and by the same amount in line and trench measurement. We conducted the experiments to see the effect, and found out there exists the dependence of the measured linewidths on the setpoint in the consistent behavior as our hand-waving predicts. The effect may be a significant uncertainty source in the CD-AFM metrology.
引用
收藏
页数:12
相关论文
共 11 条
[1]   COMBINED SHEAR FORCE AND NEAR-FIELD SCANNING OPTICAL MICROSCOPY [J].
BETZIG, E ;
FINN, PL ;
WEINER, JS .
APPLIED PHYSICS LETTERS, 1992, 60 (20) :2484-2486
[2]   Influence of the water layer on the shear force damping in near-field microscopy [J].
Davy, S ;
Spajer, M ;
Courjon, D .
APPLIED PHYSICS LETTERS, 1998, 73 (18) :2594-2596
[3]   CD-AFM reference metrology at NIST and SEMATECH [J].
Dixson, R ;
Fu, J ;
Orji, N ;
Guthrie, W ;
Allen, R ;
Cresswell, M .
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIX, PTS 1-3, 2005, 5752 :324-336
[4]  
LIU HC, 2006, SPIE P, V6152
[5]  
LIU HC, 2008, SPIE P IN PRESS, V6922
[6]   METHOD FOR IMAGING SIDEWALLS BY ATOMIC-FORCE MICROSCOPY [J].
MARTIN, Y ;
WICKRAMASINGHE, HK .
APPLIED PHYSICS LETTERS, 1994, 64 (19) :2498-2500
[7]  
MININNI L, 2007, SPIE P, V6518
[8]   Higher order tip effects in traceable CD-AFM-based linewidth measurements [J].
Orji, N. G. ;
Dixson, R. G. .
MEASUREMENT SCIENCE AND TECHNOLOGY, 2007, 18 (02) :448-455
[9]   CD metrology for the 45-nm and 32-nm nodes [J].
Rice, BJ ;
Cao, HB ;
Chaudhuri, O ;
Grumski, M ;
Harteneck, BD ;
Liddle, A ;
Olynick, D .
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2, 2004, 5375 :183-190
[10]  
UKRAINTSEV VA, 2005, SPIE P, V5752