Texture and grain structure in polycrystalline silver films deposited by partially ionised beam

被引:3
作者
Adamik, M
Barna, PB
Tomov, I
机构
[1] Hungarian Acad Sci, Res Inst Tech Phys & Mat Sci, H-1121 Budapest, Hungary
[2] Bulgarian Acad Sci, Inst Phys Chem, Sofia 1113, Bulgaria
关键词
texture; grain growth; grain morphology; impurity; silver;
D O I
10.1016/S0042-207X(01)00125-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The analysis of grain growth mechanisms is carried out by the investigation of the correlation between texture and average grain size in polycrystalline silver films deposited by e-beam evaporation. The results indicate that the ion bombardment can enhance the texture evolution by changing the driving force for abnormal grain growth. This effect is attributed to the enhanced desorption of impurities from the free surface of the films due to ion bombardment. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:251 / 255
页数:5
相关论文
共 13 条
[1]   Correlation between texture and average grain size in polycrystalline Ag thin films [J].
Adamik, M ;
Barna, PB ;
Tomov, I .
THIN SOLID FILMS, 2000, 359 (01) :33-38
[2]   Fundamental structure forming phenomena of polycrystalline films and the structure zone models [J].
Barna, PB ;
Adamik, M .
THIN SOLID FILMS, 1998, 317 (1-2) :27-33
[3]   MICROSTRUCTURAL EVOLUTION IN THIN-FILMS [J].
FROST, HJ .
MATERIALS CHARACTERIZATION, 1994, 32 (04) :257-273
[4]   ABNORMAL GRAIN-GROWTH IN ALUMINUM-ALLOY THIN-FILMS [J].
LONGWORTH, HP ;
THOMPSON, CV .
JOURNAL OF APPLIED PHYSICS, 1991, 69 (07) :3929-3940
[5]   DETERMINATION OF SURFACE ENERGY OF COPPER AS A FUNCTION OF CRYSTALLOGRAPHIC ORIENTATION AND TEMPERATURE [J].
MCLEAN, M .
ACTA METALLURGICA, 1971, 19 (04) :387-&
[6]  
MOVCHAN BA, 1969, PHYS METALS METALLOG, V28, P83
[7]  
SAFRAN G, 1993, MICROSCOPIA ELETTRON, V14, P89
[8]  
Shewmon PG, 1963, METAL SURFACES STRUC, P67
[9]   GRAIN-GROWTH PHENOMENA IN FILMS - A MONTE-CARLO APPROACH [J].
SROLOVITZ, DJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2925-2931
[10]   INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS [J].
THORNTON, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :666-670