Plasmonic metallic nanostructures by direct nanoimprinting of gold nanoparticles

被引:51
作者
Liang, Chia-Ching [1 ]
Liao, Mei-Yi [2 ]
Chen, Wen-Yu [1 ]
Cheng, Tsung-Chieh [3 ]
Chang, Wen-Huei [4 ]
Lin, Chun-Hung [1 ,5 ]
机构
[1] Natl Cheng Kung Univ, Inst Electroopt Sci & Engn, Tainan 701, Taiwan
[2] Natl Nano Device Labs, Hsinchu 300, Taiwan
[3] Natl Kaohsiung Univ Appl Sci, Dept Mech Engn, Kaohsiung 807, Taiwan
[4] Natl Pingtung Univ Educ, Dept Biol Chem, Pingtung 900, Taiwan
[5] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 701, Taiwan
来源
OPTICS EXPRESS | 2011年 / 19卷 / 05期
关键词
RESONANCE; LITHOGRAPHY; NM; IMMUNOASSAY; ELECTRONICS; FABRICATION;
D O I
10.1364/OE.19.004768
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We demonstrated the plasmonic metallic nanostructure fabricated by direct nanoimprinting of gold nanoparticles (AuNPs). This approach combines the patterning and lift-off processes into a simple one-step process without the need for expensive patterning lithographies and the stringent requirement of the lift-off process for nanostructures. Good imprinting integrity was accomplished with a negligible residual layer. The dynamic optical responses of the imprinted gold pillars from AuNPs to the bulk material during the annealing process were investigated. The localized surface plasmon resonance (LSPR) properties of AuNPs or gold pillar arrays can be controlled and tuned during the annealing process. The sensitivity of the gold pillar array in terms of the wavelength shift per refractive index unit (RIU) reached 259 nm/RIU. The size of the imprinted gold pillars is highly scalable in our process. The corresponding resonance wavelengths can be widely tuned from the visible to infrared region by changing the size of the gold pillars, thus providing a wide range of sensing capability. (C) 2011 Optical Society of America
引用
收藏
页码:4768 / 4776
页数:9
相关论文
共 37 条
[1]   Single-defect photonic crystal cavity laser fabricated by a combination of laser holography and focused ion beam lithography [J].
Ahn, Sungmo ;
Kim, Sihan ;
Jeon, Heonsu .
APPLIED PHYSICS LETTERS, 2010, 96 (13)
[2]   Optical properties of gold nanorings -: art. no. 057401 [J].
Aizpurua, J ;
Hanarp, P ;
Sutherland, DS ;
Käll, M ;
Bryant, GW ;
de Abajo, FJG .
PHYSICAL REVIEW LETTERS, 2003, 90 (05) :4
[3]   Improving stamps for 10 nm level wafer scale nanoimprint lithography [J].
Beck, M ;
Graczyk, M ;
Maximov, I ;
Sarwe, EL ;
Ling, TGI ;
Keil, M ;
Montelius, L .
MICROELECTRONIC ENGINEERING, 2002, 61-2 :441-448
[4]  
Bohren CF., 2008, Absorption and scattering of light by small particles, DOI DOI 10.1002/9783527618156
[5]   A multi-functional plasmonic biosensor [J].
Chang, Yun-Tzu ;
Lai, Yueh-Chun ;
Li, Chung-Tien ;
Chen, Cheng-Kuang ;
Yen, Ta-Jen .
OPTICS EXPRESS, 2010, 18 (09) :9561-9569
[6]   Shape- and size-dependent refractive index sensitivity of gold nanoparticles [J].
Chen, Huanjun ;
Kou, Xiaoshan ;
Yang, Zhi ;
Ni, Weihai ;
Wang, Jianfang .
LANGMUIR, 2008, 24 (10) :5233-5237
[7]   A standing-wave interpretation of plasmon resonance excitation in split-ring resonators [J].
Chen, Wen-Yu ;
Lin, Chun-Hung .
OPTICS EXPRESS, 2010, 18 (13) :14280-14292
[8]   Imprint lithography with 25-nanometer resolution [J].
Chou, SY ;
Krauss, PR ;
Renstrom, PJ .
SCIENCE, 1996, 272 (5258) :85-87
[9]   Hole-mask colloidal lithography [J].
Fredriksson, Hans ;
Alaverdyan, Yury ;
Dmitriev, Alexandre ;
Langhammer, Christoph ;
Sutherland, Duncan S. ;
Zaech, Michael ;
Kasemo, Bengt .
ADVANCED MATERIALS, 2007, 19 (23) :4297-+
[10]   Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating [J].
Gorelick, Sergey ;
Guzenko, Vitaliy A. ;
Vila-Comamala, Joan ;
David, Christian .
NANOTECHNOLOGY, 2010, 21 (29)