XPS and RBS investigation of TiNxOy films prepared by vacuum arc discharge

被引：64

作者：

Ismail, I. M. ^{[1
]}

Abdallah, B. ^{[2
]}

Abou-Kharroub, M. ^{[2
]}

Mrad, O. ^{[1
]}

机构：

[1] Atom Energy Commiss, Dept Chem, Damascus, Syria

[2] Atom Energy Commiss, Dept Phys, Damascus, Syria

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2012年 / 271卷

关键词：

XPS; RBS; XRD; TiNxOy; Vacuum arc discharge; THIN-FILMS; TITANIUM; COATINGS; NITRIDE; SURFACE; TEMPERATURE; OXIDATION; TI;

D O I：

10.1016/j.nimb.2011.11.010

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Three titanium oxynitride films have been prepared by vacuum arc discharge technique at different chamber temperatures (50 degrees C, 150 degrees C and 300 degrees C). X-ray photoelectron spectroscopy was used to reveal the elemental and chemical compositions by analyzing high resolution spectra of Ti 2p3/2, N 1s and O 1s. Higher temperatures were found to promote the nitride components and to produce nitrogen-rich films. Homogeneity and thickness of the films have been estimated by means of Rutherford Back Scattering technique, which showed that the film thickness increased with the increasing of temperature. A significant improvement in the crystalline quality and texture when increasing the temperature was found by X-ray diffraction technique. Electrical resistivity of the films was measured at room temperature and was found to decrease from 46.6 mu Omega cm down to 26.3 mu Omega cm for the samples prepared at 50 degrees C and 300 degrees C, respectively. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：102 / 106

页数：5

共 34 条

[1] Ion beam studies of TiNxOy thin films deposited by reactive magnetron sputtering [J].