Strain relaxation and oxygen superstructure modulation in epitaxial Sr4Fe6O13±δ films -: art. no. 132105

被引：6

作者：

Santiso, J

Pardo, JA

Solís, C

Garcia, G

Figueras, A

Rossell, MD

Van Tendeloo, G

机构：

[1] CSIC, Inst Ciencia Mat Barcelona, Bellaterra, Spain

[2] Univ Antwerp, Electron Microscopy Mat Res EMAT, B-2020 Antwerp, Belgium

来源：

APPLIED PHYSICS LETTERS | 2005年 / 86卷 / 13期

关键词：

D O I：

10.1063/1.1886264

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The compressive strain induced in epitaxial Sr4Fe6O13+/-delta (SFO) films of different thicknesses grown on SrTiO3 substrates is partially released by the modulation of the incommensurate oxygen superstructure along the a-axis parallel to the substrate [q=alpha a(m)* superspace group Xmmm(alpha 00)0s0]. The modulation alpha value varies proportionally to the in-plane a-parameter in a continuous range from 0.41, for fully strained thin films, of about 20-30 nm, to 0.44 for partially-relaxed thicker films of about 280 nm. This mechanism is responsible for the observed slow relaxation of the cell structure upon the film thickness increase in comparison with an equilibrium misfit dislocation-mediated relaxation. (C) 2005 American Institute of Physics.

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页码：1 / 3

页数：3

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